Kazuyoshi Eshima

Person

Tosu-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Flow-rate regulator device, diluted chemical-liquid supply device,...
- Patent number 10,276,408
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Michitaka Amiya
- G05 - CONTROLLING REGULATING
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 9,452,397
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Hiroshi Komiya
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing apparatus
- Patent number 8,978,670
- Issue date Mar 17, 2015
- Tokyo Electron Limited
- Junya Minamida
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Cleaning apparatus, substrate processing system, cleaning method, p...
- Patent number 8,820,335
- Issue date Sep 2, 2014
- Tokyo Electron Limited
- Michitaka Amiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrasonic cleaning apparatus, ultrasonic cleaning method, and stor...
- Patent number 8,777,695
- Issue date Jul 15, 2014
- Tokyo Electron Limited
- Hideaki Sato
- B08 - CLEANING
Information Patent Grant
Liquid heating unit, liquid processing apparatus including the same...
- Patent number 8,670,656
- Issue date Mar 11, 2014
- Tokyo Electron Limited
- Toshihiko Nishida
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Liquid treatment method and storage system
- Patent number 8,652,344
- Issue date Feb 18, 2014
- Tokyo Electron Limited
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of replacing liquid of circulation line in substrate liquid...
- Patent number 8,607,730
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kazuyoshi Eshima
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Liquid processing apparatus for substrate, method for generating pr...
- Patent number 8,590,548
- Issue date Nov 26, 2013
- Tokyo Electron Limited
- Kazuyoshi Eshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process liquid supply system, process liquid supply method, and sto...
- Patent number 8,408,234
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Keisuke Sasaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate cleaning method and substrate cleaning apparatus
- Patent number 8,083,857
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning apparatus including cleaning tank with improved cover
- Patent number 7,900,640
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Kazuyoshi Eshima
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FLOW-RATE REGULATOR DEVICE, DILUTED CHEMICAL-LIQUID SUPPLY DEVICE,...
- Publication number 20150380280
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Michitaka AMIYA
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20130223180
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Hiroshi Komiya
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Liquid Heating Unit, Liquid Processing Apparatus Including the Same...
- Publication number 20120063754
- Publication date Mar 15, 2012
- TOKYO ELECTRON LIMITED
- Toshihiko Nishida
- F24 - HEATING RANGES VENTILATING
Information Patent Application
METHOD OF REPLACING LIQUID OF CIRCULATION LINE IN SUBSTRATE LIQUID...
- Publication number 20110132465
- Publication date Jun 9, 2011
- TOKYO ELECTRON LIMITED
- Kazuyoshi ESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20110079252
- Publication date Apr 7, 2011
- TOKYO ELECTRON LIMITED
- Junya MINAMIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS FOR SUBSTRATE, METHOD FOR GENERATING PR...
- Publication number 20110061683
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Kazuyoshi ESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STOR...
- Publication number 20110056512
- Publication date Mar 10, 2011
- TOKYO ELECTRON LIMITED
- Hideaki SATO
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS, SUBSTRATE PROCESSING SYSTEM, CLEANING METHOD, P...
- Publication number 20100288313
- Publication date Nov 18, 2010
- TOKYO ELECTRON LIMITED
- Michitaka AMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRA...
- Publication number 20100043835
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Kazuyoshi ESHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID TREATMENT METHOD AND STORAGE SYSTEM
- Publication number 20090179007
- Publication date Jul 16, 2009
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate cleaning method and substrate cleaning apparatus
- Publication number 20080308120
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process liquid supply system, process liquid supply method, and sto...
- Publication number 20070221271
- Publication date Sep 27, 2007
- Keisuke Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid treatment device and liquid treatment method
- Publication number 20060060232
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Kotaro Tsurusaki
- H01 - BASIC ELECTRIC ELEMENTS

Kazuyoshi Eshima

Person

Patents Grantslast 30 patents

Flow-rate regulator device, diluted chemical-liquid supply device,...

Liquid processing apparatus, liquid processing method, and storage...

Substrate processing apparatus

Cleaning apparatus, substrate processing system, cleaning method, p...

Ultrasonic cleaning apparatus, ultrasonic cleaning method, and stor...

Liquid heating unit, liquid processing apparatus including the same...

Liquid treatment method and storage system

Method of replacing liquid of circulation line in substrate liquid...

Liquid processing apparatus for substrate, method for generating pr...

Process liquid supply system, process liquid supply method, and sto...

Substrate cleaning method and substrate cleaning apparatus

Cleaning apparatus including cleaning tank with improved cover

Patents Applicationslast 30 patents

FLOW-RATE REGULATOR DEVICE, DILUTED CHEMICAL-LIQUID SUPPLY DEVICE,...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

Liquid Heating Unit, Liquid Processing Apparatus Including the Same...

METHOD OF REPLACING LIQUID OF CIRCULATION LINE IN SUBSTRATE LIQUID...

SUBSTRATE PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS FOR SUBSTRATE, METHOD FOR GENERATING PR...

ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STOR...

CLEANING APPARATUS, SUBSTRATE PROCESSING SYSTEM, CLEANING METHOD, P...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRA...

LIQUID TREATMENT METHOD AND STORAGE SYSTEM

Substrate cleaning method and substrate cleaning apparatus

Process liquid supply system, process liquid supply method, and sto...

Liquid treatment device and liquid treatment method