Kazuyuki MIURA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method, pressure control apparatus and substra...
- Patent number 11,742,188
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Kazuyuki Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate measurement apparatus and method for more accurately meas...
- Patent number 11,326,914
- Issue date May 10, 2022
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining flow rate of a gas in a substrate processing...
- Patent number 10,876,870
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing system and method of determining flow rate of gas
- Patent number 10,871,786
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Heating device and turbo molecular pump
- Patent number 10,801,521
- Issue date Oct 13, 2020
- Tokyo Electron Limited
- Tsutomu Mochizuki
- B08 - CLEANING
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,921,089
- Issue date Mar 20, 2018
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Semiconductor manufacturing apparatus
- Patent number 9,734,993
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,383,758
- Issue date Jul 5, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 9,010,369
- Issue date Apr 21, 2015
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Flow rate range variable type flow rate control apparatus
- Patent number 8,418,714
- Issue date Apr 16, 2013
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210384017
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Takaaki NEZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, PRESSURE CONTROL APPARATUS AND SUBSTRA...
- Publication number 20210050190
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Kazuyuki MIURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALIBRATING PLURALITY OF CHAMBER PRESSURE SENSORS AND SU...
- Publication number 20200292403
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- G01 - MEASURING TESTING
Information Patent Application
FLOW RATE MEASUREMENT METHOD AND FLOW RATE MEASUREMENT APPARATUS
- Publication number 20200278225
- Publication date Sep 3, 2020
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD OF DETERMINING FLOW RATE OF GAS
- Publication number 20190301912
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING FLOW RATE OF GAS
- Publication number 20190212176
- Publication date Jul 11, 2019
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G01 - MEASURING TESTING
Information Patent Application
HEATING DEVICE AND TURBO MOLECULAR PUMP
- Publication number 20170298958
- Publication date Oct 19, 2017
- TOKYO ELECTRON LIMITED
- Tsutomu MOCHIZUKI
- F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20160274595
- Publication date Sep 22, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20160109886
- Publication date Apr 21, 2016
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20150160662
- Publication date Jun 11, 2015
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20130220451
- Publication date Aug 29, 2013
- Fujikin Incorporated
- Tadahiro Ohmi
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20120325796
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Atsushi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS
- Publication number 20100139775
- Publication date Jun 10, 2010
- Fujikin Incorporated
- Tadahiro Ohmi
- G05 - CONTROLLING REGULATING
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING

Kazuyuki MIURA

Person

Patents Grantslast 30 patents

Substrate processing method, pressure control apparatus and substra...

Flow rate measurement apparatus and method for more accurately meas...

Method of determining flow rate of a gas in a substrate processing...

Substrate processing system and method of determining flow rate of gas

Heating device and turbo molecular pump

Flow rate range variable type flow rate control apparatus

Semiconductor manufacturing apparatus

Flow rate range variable type flow rate control apparatus

Flow rate range variable type flow rate control apparatus

Flow rate range variable type flow rate control apparatus

Relative pressure control system and relative flow control system

Patents Applicationslast 30 patents

TRAP APPARATUS AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD, PRESSURE CONTROL APPARATUS AND SUBSTRA...

METHOD FOR CALIBRATING PLURALITY OF CHAMBER PRESSURE SENSORS AND SU...

FLOW RATE MEASUREMENT METHOD AND FLOW RATE MEASUREMENT APPARATUS

SUBSTRATE PROCESSING SYSTEM AND METHOD OF DETERMINING FLOW RATE OF GAS

METHOD OF DETERMINING FLOW RATE OF GAS

HEATING DEVICE AND TURBO MOLECULAR PUMP

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS

FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS

Relative pressure control system and relative flow control system