Kedarnath Sangam

Person

People

Patents Grantslast 30 patents

Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,920,451
- Issue date Mar 20, 2018
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,556,522
- Issue date Jan 31, 2017
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slit valve having increased flow uniformity
- Patent number 9,423,042
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Chandrasekhar Balasubramanyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,888,916
- Issue date Nov 18, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Rapid thermal processing lamphead with improved cooling
- Patent number 8,698,049
- Issue date Apr 15, 2014
- Applied Materials, Inc.
- Joseph M. Ranish
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,673,081
- Issue date Mar 18, 2014
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,663,753
- Issue date Mar 4, 2014
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,608,853
- Issue date Dec 17, 2013
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Apparatus and method for supporting, positioning and rotating a sub...
- Patent number 8,490,660
- Issue date Jul 23, 2013
- Applied Materials, Inc.
- Blake Koelmel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process gas delivery for semiconductor process chambers
- Patent number 8,382,897
- Issue date Feb 26, 2013
- Applied Materials, Inc.
- Kedarnath Sangam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Slit valve having increased flow uniformity
- Patent number 8,377,213
- Issue date Feb 19, 2013
- Applied Materials, Inc.
- Chandrasekhar Balasubramanyam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,298,629
- Issue date Oct 30, 2012
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rapid thermal processing lamphead with improved cooling
- Patent number 8,294,068
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Joseph M. Ranish
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Process gas delivery for semiconductor process chamber
- Patent number 8,187,381
- Issue date May 29, 2012
- Applied Materials, Inc.
- Kedarnath Sangam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for supporting, positioning and rotating a sub...
- Patent number 8,057,601
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Blake Koelmel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for supporting, positioning and rotating a sub...
- Patent number 8,057,602
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Blake Koelmel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal reactor with improved gas flow distribution
- Patent number 8,056,500
- Issue date Nov 15, 2011
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Control of gas flow and delivery to suppress the formation of parti...
- Patent number 7,794,544
- Issue date Sep 14, 2010
- Applied Materials, Inc.
- Son T. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20140311403
- Publication date Oct 23, 2014
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20140295106
- Publication date Oct 2, 2014
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20140079376
- Publication date Mar 20, 2014
- Applied Materials, Inc.
- Ming-Kuei (Michael) TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLIT VALVE HAVING INCREASED FLOW UNIFORMITY
- Publication number 20130153807
- Publication date Jun 20, 2013
- Applied Materials, Inc.
- CHANDRASEKHAR BALASUBRAMANYAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20130059430
- Publication date Mar 7, 2013
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
RAPID THERMAL PROCESSING LAMPHEAD WITH IMPROVED COOLING
- Publication number 20130044493
- Publication date Feb 21, 2013
- Applied Materials, Inc.
- JOSEPH M. RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBERS
- Publication number 20120208372
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- KEDARNATH SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...
- Publication number 20120055405
- Publication date Mar 8, 2012
- BLAKE KOELMEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20120058648
- Publication date Mar 8, 2012
- Ming-Kuei (Michael) Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20100263587
- Publication date Oct 21, 2010
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20100215872
- Publication date Aug 26, 2010
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
AMPOULE AND DELIVERY SYSTEM FOR SOLID PRECURSORS
- Publication number 20100116208
- Publication date May 13, 2010
- Applied Materials, Inc.
- KEDARNATH S. SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DELIVERY SYSTEM HAVING REDUCED PRESSURE VARIATION
- Publication number 20100116206
- Publication date May 13, 2010
- Applied Materials, Inc.
- KEDARNATH S. SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAPID THERMAL PROCESSING LAMPHEAD WITH IMPROVED COOLING
- Publication number 20100059497
- Publication date Mar 11, 2010
- Applied Materials, Inc.
- JOSEPH M. RANISH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBER
- Publication number 20100048032
- Publication date Feb 25, 2010
- Applied Materials, Inc.
- KEDARNATH SANGAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SLIT VALVE HAVING INCREASED FLOW UNIFORMITY
- Publication number 20090272324
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- CHANDRASEKHAR BALASUBRAMANYAM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION
- Publication number 20090163042
- Publication date Jun 25, 2009
- Applied Materials, Inc.
- Ming-Kuei (Michael) Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...
- Publication number 20080280453
- Publication date Nov 13, 2008
- APPLIED MATERIALS, INC.
- Blake KOELMEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...
- Publication number 20080276864
- Publication date Nov 13, 2008
- BLAKE KOELMEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTI...
- Publication number 20080041307
- Publication date Feb 21, 2008
- Son T. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Control of gas flow and delivery to suppress the formation of parti...
- Publication number 20050252449
- Publication date Nov 17, 2005
- Son T. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kedarnath Sangam

Person

Patents Grantslast 30 patents

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Slit valve having increased flow uniformity

Thermal reactor with improved gas flow distribution

Rapid thermal processing lamphead with improved cooling

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Thermal reactor with improved gas flow distribution

Apparatus and method for supporting, positioning and rotating a sub...

Process gas delivery for semiconductor process chambers

Slit valve having increased flow uniformity

High throughput multi-wafer epitaxial reactor

Rapid thermal processing lamphead with improved cooling

Process gas delivery for semiconductor process chamber

Apparatus and method for supporting, positioning and rotating a sub...

Apparatus and method for supporting, positioning and rotating a sub...

Thermal reactor with improved gas flow distribution

Control of gas flow and delivery to suppress the formation of parti...

Patents Applicationslast 30 patents

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

SLIT VALVE HAVING INCREASED FLOW UNIFORMITY

High Throughput Multi-Wafer Epitaxial Reactor

RAPID THERMAL PROCESSING LAMPHEAD WITH IMPROVED COOLING

PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBERS

APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

High Throughput Multi-Wafer Epitaxial Reactor

AMPOULE AND DELIVERY SYSTEM FOR SOLID PRECURSORS

GAS DELIVERY SYSTEM HAVING REDUCED PRESSURE VARIATION

RAPID THERMAL PROCESSING LAMPHEAD WITH IMPROVED COOLING

PROCESS GAS DELIVERY FOR SEMICONDUCTOR PROCESS CHAMBER

SLIT VALVE HAVING INCREASED FLOW UNIFORMITY

THERMAL REACTOR WITH IMPROVED GAS FLOW DISTRIBUTION

APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...

APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUB...

CONTROL OF GAS FLOW AND DELIVERY TO SUPPRESS THE FORMATION OF PARTI...

Control of gas flow and delivery to suppress the formation of parti...