Kee-Soo NAM

Person

Daegu-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle for EUV lithography and method of fabricating the same
- Patent number 10,859,901
- Issue date Dec 8, 2020
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for EUV lithography and method of fabricating the same
- Patent number 10,768,523
- Issue date Sep 8, 2020
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 10,036,947
- Issue date Jul 31, 2018
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift blankmask and photomask
- Patent number 10,018,905
- Issue date Jul 10, 2018
- S & S TECH CO., LTD
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift blankmask and photomask
- Patent number 9,851,632
- Issue date Dec 26, 2017
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 9,551,925
- Issue date Jan 24, 2017
- S&S TECH CO., LTD.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask
- Patent number 9,482,940
- Issue date Nov 1, 2016
- S&S TECH CO., LTD.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, photomask, and method for manufacturing same
- Patent number 9,389,500
- Issue date Jul 12, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift blankmask and method for fabricating the same
- Patent number 9,256,119
- Issue date Feb 9, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and method for fabricating photomask using the same
- Patent number 9,229,317
- Issue date Jan 5, 2016
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blankmask and photomask using the same
- Patent number 8,846,276
- Issue date Sep 30, 2014
- S&S TECH Co., Ltd.
- Kee-Soo Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME
- Publication number 20190146324
- Publication date May 16, 2019
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK
- Publication number 20180335692
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME
- Publication number 20180335691
- Publication date Nov 22, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME
- Publication number 20180259845
- Publication date Sep 13, 2018
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20170023854
- Publication date Jan 26, 2017
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK
- Publication number 20160291451
- Publication date Oct 6, 2016
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND PHOTOMASK
- Publication number 20160054650
- Publication date Feb 25, 2016
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20150268552
- Publication date Sep 24, 2015
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING SAME
- Publication number 20150212403
- Publication date Jul 30, 2015
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK
- Publication number 20150093689
- Publication date Apr 2, 2015
- S&S TECH Co., Ltd.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND METHOD FOR FABRICATING PHOTOMASK USING THE SAME
- Publication number 20140004449
- Publication date Jan 2, 2014
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT BLANKMASK AND METHOD FOR FABRICATING THE SAME
- Publication number 20130288165
- Publication date Oct 31, 2013
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANKMASK AND PHOTOMASK USING THE SAME
- Publication number 20130095415
- Publication date Apr 18, 2013
- S&S TECH CO., LTD.
- Kee-Soo NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kee-Soo NAM

Person

Patents Grantslast 30 patents

Pellicle for EUV lithography and method of fabricating the same

Pellicle for EUV lithography and method of fabricating the same

Blankmask and photomask using the same

Phase shift blankmask and photomask

Phase-shift blankmask and photomask

Blankmask and photomask using the same

Blankmask and photomask

Mask blank, photomask, and method for manufacturing same

Phase-shift blankmask and method for fabricating the same

Blankmask and method for fabricating photomask using the same

Blankmask and photomask using the same

Patents Applicationslast 30 patents

PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME

PHASE-SHIFT BLANKMASK AND PHASE-SHIFT PHOTOMASK

PHASE-SHIFT BLANKMASK AND METHOD OF FABRICATING THE SAME

PELLICLE FOR EUV LITHOGRAPHY AND METHOD OF FABRICATING THE SAME

BLANKMASK AND PHOTOMASK USING THE SAME

PHASE SHIFT BLANKMASK AND PHOTOMASK

PHASE-SHIFT BLANKMASK AND PHOTOMASK

BLANKMASK AND PHOTOMASK USING THE SAME

MASK BLANK, PHOTOMASK, AND METHOD FOR MANUFACTURING SAME

BLANKMASK AND PHOTOMASK

BLANKMASK AND METHOD FOR FABRICATING PHOTOMASK USING THE SAME

PHASE-SHIFT BLANKMASK AND METHOD FOR FABRICATING THE SAME

BLANKMASK AND PHOTOMASK USING THE SAME