Kei Hayasaki

Person

Kamakura-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, film forming apparatus, pattern forming method...
- Patent number 8,071,157
- Issue date Dec 6, 2011
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and a semiconductor device manufacturing method
- Patent number 7,972,765
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method to form resist pattern
- Patent number 7,968,272
- Issue date Jun 28, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure inspection method, pattern formation method, process cond...
- Patent number 7,903,264
- Issue date Mar 8, 2011
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G01 - MEASURING TESTING
Information Patent Grant
Film forming method, film forming apparatus, pattern forming method...
- Patent number 7,799,368
- Issue date Sep 21, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
Information Patent Grant
Substrate processing method, substrate processing apparatus, and ma...
- Patent number 7,794,923
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing method and manufacturing method of semiconduct...
- Patent number 7,683,291
- Issue date Mar 23, 2010
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Substrate treating method, substrate-processing apparatus, developi...
- Patent number 7,669,608
- Issue date Mar 2, 2010
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,662,546
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Film forming method, film forming apparatus, pattern forming method...
- Patent number 7,604,832
- Issue date Oct 20, 2009
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method and a semiconductor device manufacturing method
- Patent number 7,563,561
- Issue date Jul 21, 2009
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Temperature calibration method for baking processing apparatus, adj...
- Patent number 7,510,341
- Issue date Mar 31, 2009
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure inspection method, pattern formation method, process cond...
- Patent number 7,483,155
- Issue date Jan 27, 2009
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G01 - MEASURING TESTING
Information Patent Grant
Alkaline solution and manufacturing method, and alkaline solution a...
- Patent number 7,399,578
- Issue date Jul 15, 2008
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for evaluating sensitivity of photoresist, method for prepar...
- Patent number 7,368,209
- Issue date May 6, 2008
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a pattern and substrate-processing apparatus
- Patent number 7,364,839
- Issue date Apr 29, 2008
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for evaluating a local flare, correction method for a mask p...
- Patent number 7,327,436
- Issue date Feb 5, 2008
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method, film forming apparatus, pattern forming method...
- Patent number 7,312,018
- Issue date Dec 25, 2007
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alkaline solution and manufacturing method, and alkaline solution a...
- Patent number 7,097,960
- Issue date Aug 29, 2006
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method, substrate-processing apparatus, developi...
- Patent number 7,018,481
- Issue date Mar 28, 2006
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,005,238
- Issue date Feb 28, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,005,249
- Issue date Feb 28, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 6,881,058
- Issue date Apr 19, 2005
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heating device, method for evaluating heating device and pattern fo...
- Patent number 6,831,258
- Issue date Dec 14, 2004
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a pattern
- Patent number 6,818,387
- Issue date Nov 16, 2004
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming method, film forming apparatus, pattern forming method...
- Patent number 6,800,569
- Issue date Oct 5, 2004
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ALKALINE SOLUTION AND MANUFACTURING METHOD, AND ALKALINE SOLUTION A...
- Patent number 6,742,944
- Issue date Jun 1, 2004
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method using photolithography
- Patent number 6,686,130
- Issue date Feb 3, 2004
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Heating device, method for evaluating heating device and pattern fo...
- Patent number 6,603,101
- Issue date Aug 5, 2003
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating device, method for evaluating heating device and pattern fo...
- Patent number 6,441,351
- Issue date Aug 27, 2002
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...
- Publication number 20110229826
- Publication date Sep 22, 2011
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING METHOD, FILM FORMING APPARATUS, PATTERN FORMING METHOD...
- Publication number 20110212255
- Publication date Sep 1, 2011
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD, FILM FORMING APPARATUS, PATTERN FORMING METHOD...
- Publication number 20110008545
- Publication date Jan 13, 2011
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING METHOD, SUBSTRATE-PROCESSING APPARATUS, DEVELOPI...
- Publication number 20100104988
- Publication date Apr 29, 2010
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and a semiconductor device manufacturing method
- Publication number 20090246710
- Publication date Oct 1, 2009
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS COND...
- Publication number 20090002722
- Publication date Jan 1, 2009
- Kabushiki Kaisha Toshiba
- KEI HAYASAKI
- G01 - MEASURING TESTING
Information Patent Application
Film forming method, film forming apparatus, pattern forming method...
- Publication number 20080090001
- Publication date Apr 17, 2008
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and semiconductor device manufacturing...
- Publication number 20080003837
- Publication date Jan 3, 2008
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate treatment method, substrate treatment apparatus, and semi...
- Publication number 20070199579
- Publication date Aug 30, 2007
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method, substrate processing apparatus, and ma...
- Publication number 20070190462
- Publication date Aug 16, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method to form resist pattern, a...
- Publication number 20070128554
- Publication date Jun 7, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alkaline solution and manufacturing method, and alkaline solution a...
- Publication number 20070037099
- Publication date Feb 15, 2007
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method and manufacturing method of semiconduct...
- Publication number 20060289431
- Publication date Dec 28, 2006
- Kei Hayasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern forming method and a semiconductor device manufacturing method
- Publication number 20060110687
- Publication date May 25, 2006
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for processing substrate and method of processing the same
- Publication number 20060102614
- Publication date May 18, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for evaluating a local flare, correction method for a mask p...
- Publication number 20050275820
- Publication date Dec 15, 2005
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Structure inspection method, pattern formation method, process cond...
- Publication number 20050168758
- Publication date Aug 4, 2005
- Kei Hayasaki
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for processing substrate and method of processing the same
- Publication number 20050158670
- Publication date Jul 21, 2005
- Kabushiki Kaisha Toshiba at Reel 012413/Frame 0041
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for processing substrate and method of processing the same
- Publication number 20050118536
- Publication date Jun 2, 2005
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate treating method, substrate-processing apparatus, developi...
- Publication number 20050087217
- Publication date Apr 28, 2005
- Kabushiki Kaisha Toshiba
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alkaline solution and manufacturing method, and alkaline solution a...
- Publication number 20050058944
- Publication date Mar 17, 2005
- KABUSHIKI KAISHA
- Riichiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film forming method, film forming apparatus, pattern forming method...
- Publication number 20050026456
- Publication date Feb 3, 2005
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method, film forming apparatus, pattern forming method...
- Publication number 20050022732
- Publication date Feb 3, 2005
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature calibration method for baking processing apparatus, adj...
- Publication number 20050008979
- Publication date Jan 13, 2005
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for evaluating sensitivity of photoresist, method for prepar...
- Publication number 20040265713
- Publication date Dec 30, 2004
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a pattern and substrate-processing apparatus
- Publication number 20040131980
- Publication date Jul 8, 2004
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Heating device, method for evaluating heating device and pattern fo...
- Publication number 20040089651
- Publication date May 13, 2004
- KABUSHIKI KAISHA TOSHIBA
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate treating method, substrate-processing apparatus, developi...
- Publication number 20040029026
- Publication date Feb 12, 2004
- Kei Hayasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film forming method, film forming apparatus, pattern forming method...
- Publication number 20030211756
- Publication date Nov 13, 2003
- Shinichi Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alkaline solution and manufacturing method, and alkaline solution a...
- Publication number 20030068579
- Publication date Apr 10, 2003
- Kabushiki Kaisha Toshiba
- Riichiro Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kei Hayasaki

Person

Patents Grantslast 30 patents

Film forming method, film forming apparatus, pattern forming method...

Pattern forming method and a semiconductor device manufacturing method

Semiconductor device manufacturing method to form resist pattern

Structure inspection method, pattern formation method, process cond...

Film forming method, film forming apparatus, pattern forming method...

Substrate processing method, substrate processing apparatus, and ma...

Substrate processing method and manufacturing method of semiconduct...

Substrate treating method, substrate-processing apparatus, developi...

Apparatus for processing substrate and method of processing the same

Film forming method, film forming apparatus, pattern forming method...

Pattern forming method and a semiconductor device manufacturing method

Temperature calibration method for baking processing apparatus, adj...

Structure inspection method, pattern formation method, process cond...

Alkaline solution and manufacturing method, and alkaline solution a...

Method for evaluating sensitivity of photoresist, method for prepar...

Method for forming a pattern and substrate-processing apparatus

Method for evaluating a local flare, correction method for a mask p...

Film forming method, film forming apparatus, pattern forming method...

Alkaline solution and manufacturing method, and alkaline solution a...

Substrate treating method, substrate-processing apparatus, developi...

Apparatus for processing substrate and method of processing the same

Apparatus for processing substrate and method of processing the same

Apparatus for processing substrate and method of processing the same

Heating device, method for evaluating heating device and pattern fo...

Method of forming a pattern

Film forming method, film forming apparatus, pattern forming method...

ALKALINE SOLUTION AND MANUFACTURING METHOD, AND ALKALINE SOLUTION A...

Pattern forming method using photolithography

Heating device, method for evaluating heating device and pattern fo...

Heating device, method for evaluating heating device and pattern fo...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...

FILM FORMING METHOD, FILM FORMING APPARATUS, PATTERN FORMING METHOD...

FILM FORMING METHOD, FILM FORMING APPARATUS, PATTERN FORMING METHOD...

SUBSTRATE TREATING METHOD, SUBSTRATE-PROCESSING APPARATUS, DEVELOPI...

Pattern forming method and a semiconductor device manufacturing method

STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS COND...

Film forming method, film forming apparatus, pattern forming method...

Substrate processing method and semiconductor device manufacturing...

Substrate treatment method, substrate treatment apparatus, and semi...

Substrate processing method, substrate processing apparatus, and ma...

Semiconductor device manufacturing method to form resist pattern, a...

Alkaline solution and manufacturing method, and alkaline solution a...

Substrate processing method and manufacturing method of semiconduct...

Pattern forming method and a semiconductor device manufacturing method

Apparatus for processing substrate and method of processing the same

Method for evaluating a local flare, correction method for a mask p...

Structure inspection method, pattern formation method, process cond...

Apparatus for processing substrate and method of processing the same

Apparatus for processing substrate and method of processing the same

Substrate treating method, substrate-processing apparatus, developi...

Alkaline solution and manufacturing method, and alkaline solution a...

Film forming method, film forming apparatus, pattern forming method...

Film forming method, film forming apparatus, pattern forming method...

Temperature calibration method for baking processing apparatus, adj...

Method for evaluating sensitivity of photoresist, method for prepar...

Method for forming a pattern and substrate-processing apparatus

Heating device, method for evaluating heating device and pattern fo...

Substrate treating method, substrate-processing apparatus, developi...

Film forming method, film forming apparatus, pattern forming method...

Alkaline solution and manufacturing method, and alkaline solution a...