Kei Kasuya

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Hitachi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for producing patterned cu...
- Patent number 9,633,848
- Issue date Apr 25, 2017
- Hitachi Chemical Company, Ltd.
- Yu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for manufacturing patterne...
- Patent number 9,395,626
- Issue date Jul 19, 2016
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, method of creating resis...
- Patent number 8,836,089
- Issue date Sep 16, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition, method of forming silica-based coa...
- Patent number 8,158,981
- Issue date Apr 17, 2012
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...
- Publication number 20150325431
- Publication date Nov 12, 2015
- Hitachi Chemical Company, Ltd.
- Yu AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNE...
- Publication number 20140322635
- Publication date Oct 30, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIS...
- Publication number 20130168859
- Publication date Jul 4, 2013
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING...
- Publication number 20120021190
- Publication date Jan 26, 2012
- Yousuke Aoki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COA...
- Publication number 20100102321
- Publication date Apr 29, 2010
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY