Kei Kobayashi

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reading device and image forming apparatus
- Patent number 11,968,339
- Issue date Apr 23, 2024
- FUJIFILM Business Innovation Corp.
- Taisuke Endo
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Imprint apparatus, imprint method, and manufacturing method of semi...
- Patent number 11,953,825
- Issue date Apr 9, 2024
- Kioxia Corporation
- Masayuki Hatano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint device, imprint method, and semiconductor device manufactur...
- Patent number 11,835,854
- Issue date Dec 5, 2023
- Kioxia Corporation
- Kasumi Okabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reading device and image forming apparatus
- Patent number 11,533,405
- Issue date Dec 20, 2022
- FUJIFILM Business Innovation Corp.
- Kei Otagiri
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Template, template manufacturing method, and semiconductor device m...
- Patent number 11,192,282
- Issue date Dec 7, 2021
- TOSHIBA MEMORY CORPORATION
- Kei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprinting method and semiconductor device manufacturing method
- Patent number 10,964,539
- Issue date Mar 30, 2021
- TOSHIBA MEMORY CORPORATION
- Kei Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist material and pattern forming method using same
- Patent number 10,407,542
- Issue date Sep 10, 2019
- TOSHIBA MEMORY CORPORATION
- Kei Kobayashi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Resist material and pattern forming method using same
- Patent number 10,113,030
- Issue date Oct 30, 2018
- TOSHIBA MEMORY CORPORATION
- Kei Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming pattern, manufacturing method of semiconductor de...
- Patent number 9,252,027
- Issue date Feb 2, 2016
- Kabushiki Kaisha Toshiba
- Yusuke Kasahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...
- Publication number 20230221635
- Publication date Jul 13, 2023
- KIOXIA Corporation
- Masayuki HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
READING DEVICE AND IMAGE FORMING APPARATUS
- Publication number 20230057360
- Publication date Feb 23, 2023
- FUJIFILM Business Innovation Corp.
- Taisuke ENDO
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...
- Publication number 20220055254
- Publication date Feb 24, 2022
- Toshiba Memory Corporation
- Kei KOBAYASHI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT DEVICE, IMPRINT METHOD, AND SEMICONDUCTOR DEVICE MANUFACTUR...
- Publication number 20200387066
- Publication date Dec 10, 2020
- KIOXIA Corporation
- Kasumi OKABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINTING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20200303190
- Publication date Sep 24, 2020
- Toshiba Memory Corporation
- Kei KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...
- Publication number 20200073233
- Publication date Mar 5, 2020
- Toshiba Memory Corporation
- Masayuki HATANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...
- Publication number 20190263024
- Publication date Aug 29, 2019
- Toshiba Memory Corporation
- Kei KOBAYASHI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME
- Publication number 20190023842
- Publication date Jan 24, 2019
- Toshiba Memory Corporation
- Kei KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, IMPRINT METHOD, AND INTERLAYER LAYER
- Publication number 20180237562
- Publication date Aug 23, 2018
- Toshiba Memory Corporation
- Hiroshi TOKUE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME
- Publication number 20170204222
- Publication date Jul 20, 2017
- Kabushiki Kaisha Toshiba
- Kei KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION, IMPRINT METHOD, AND INTERLAYER LAYER
- Publication number 20160075124
- Publication date Mar 17, 2016
- Kabushiki Kaisha Toshiba
- Hiroshi TOKUE
- B32 - LAYERED PRODUCTS
Information Patent Application
TEMPLATE, A METHOD OF PROCESSING A TEMPLATE, A METHOD OF PRODUCING...
- Publication number 20150037540
- Publication date Feb 5, 2015
- Kabushiki Kaisha Toshiba
- Kei KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME
- Publication number 20150028524
- Publication date Jan 29, 2015
- Kabushiki Kaisha Toshiba
- Kei Kobayashi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Kei Kobayashi

Person

Patents Grantslast 30 patents

Reading device and image forming apparatus

Imprint apparatus, imprint method, and manufacturing method of semi...

Imprint device, imprint method, and semiconductor device manufactur...

Reading device and image forming apparatus

Template, template manufacturing method, and semiconductor device m...

Imprinting method and semiconductor device manufacturing method

Resist material and pattern forming method using same

Resist material and pattern forming method using same

Method of forming pattern, manufacturing method of semiconductor de...

Patents Applicationslast 30 patents

IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...

READING DEVICE AND IMAGE FORMING APPARATUS

TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...

IMPRINT DEVICE, IMPRINT METHOD, AND SEMICONDUCTOR DEVICE MANUFACTUR...

IMPRINTING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...

TEMPLATE, TEMPLATE MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE M...

RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME

PHOTOSENSITIVE COMPOSITION, IMPRINT METHOD, AND INTERLAYER LAYER

RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME

PHOTOSENSITIVE COMPOSITION, IMPRINT METHOD, AND INTERLAYER LAYER

TEMPLATE, A METHOD OF PROCESSING A TEMPLATE, A METHOD OF PRODUCING...

RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME