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Kei Sakamoto
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Kawasaki, JP
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last 30 patents
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Patent Grant
Developer for photosensitive polyimide resin composition
Patent number
6,403,289
Issue date
Jun 11, 2002
Nippon Zeon Co., Ltd.
Akira Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive polyimide resin composition
Patent number
6,160,081
Issue date
Dec 12, 2000
Nippon Zeon Co., Ltd.
Akira Tanaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Pattern forming process
Patent number
5,886,136
Issue date
Mar 23, 1999
Nippon Zeon Co., Ltd.
Akira Tanaka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive polyimide resin composition
Patent number
5,777,068
Issue date
Jul 7, 1998
Nippon Zeon Co., Ltd.
Akira Tanaka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY