Keiichi IBATA

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 12,221,556
- Issue date Feb 11, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask-forming composition and method for manufacturing electron...
- Patent number 11,921,425
- Issue date Mar 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Hard-mask forming composition, method for manufacturing electronic...
- Patent number 11,746,189
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask-forming composition and method for manufacturing electron...
- Patent number 11,650,503
- Issue date May 16, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard-mask forming composition and method for manufacturing electron...
- Patent number 11,248,086
- Issue date Feb 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...
- Publication number 20240329534
- Publication date Oct 3, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20240118619
- Publication date Apr 11, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20230314945
- Publication date Oct 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20230221643
- Publication date Jul 13, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20210382392
- Publication date Dec 9, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC...
- Publication number 20210261731
- Publication date Aug 26, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC...
- Publication number 20210155825
- Publication date May 27, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20210132498
- Publication date May 6, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Tsuchiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20200041904
- Publication date Feb 6, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...
- Publication number 20190341253
- Publication date Nov 7, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Keiichi IBATA

Person

Patents Grantslast 30 patents

Hard-mask forming composition, method for manufacturing electronic...

Hard mask-forming composition and method for manufacturing electron...

Hard-mask forming composition, method for manufacturing electronic...

Hard mask-forming composition and method for manufacturing electron...

Hard-mask forming composition and method for manufacturing electron...

Patents Applicationslast 30 patents

FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC...

HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC...

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD MASK-FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...

HARD-MASK FORMING COMPOSITION AND METHOD FOR MANUFACTURING ELECTRON...