Keiji Konno

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,968,458
- Issue date Mar 3, 2015
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for resist underlayer film and process for producing same
- Patent number 8,808,446
- Issue date Aug 19, 2014
- JSR Corporation
- Keiji Konno
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern-forming method
- Patent number 8,263,315
- Issue date Sep 11, 2012
- JSR Corporation
- Keiji Konno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming antireflection film, layered product, and m...
- Patent number 7,709,182
- Issue date May 4, 2010
- JSR Corporation
- Nakaatsu Yoshimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming antireflection film, laminate, and method f...
- Patent number 7,514,205
- Issue date Apr 7, 2009
- JSR Corporation
- Nakaatsu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acenaphthylene derivative, polymer, and antireflection film-forming...
- Patent number 7,037,994
- Issue date May 2, 2006
- JSR Corporation
- Hikaru Sugita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation sensitive refractive index changing composition and refra...
- Patent number 6,787,289
- Issue date Sep 7, 2004
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for film formation, method of film formation, and insul...
- Patent number 6,410,150
- Issue date Jun 25, 2002
- JSR Corporation
- Takahiko Kurosawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Film-forming composition
- Patent number 6,406,794
- Issue date Jun 18, 2002
- JSR Corporation
- Atsushi Shiota
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process for producing phenylene-containing polymer and film-forming...
- Patent number 6,300,465
- Issue date Oct 9, 2001
- JSR Corporation
- Toshiyuki Akiike
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20100248167
- Publication date Sep 30, 2010
- JSR Corporation
- Keiji KONNO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION
- Publication number 20100178620
- Publication date Jul 15, 2010
- JSR Corporation
- Satoshi DEI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME
- Publication number 20100151384
- Publication date Jun 17, 2010
- JSR Corporation
- Keiji Konno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME
- Publication number 20090050020
- Publication date Feb 26, 2009
- JSR Corporation
- Keiji Konno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Antireflection Film, Layered Product, And M...
- Publication number 20080124524
- Publication date May 29, 2008
- Nakaatsu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for forming antireflection film, laminate, and method f...
- Publication number 20060223008
- Publication date Oct 5, 2006
- Nakaatsu Yoshimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Acenaphthylene derivative, polymer, and antireflection film-forming...
- Publication number 20040034155
- Publication date Feb 19, 2004
- Hikaru Sugita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Radiation sensitive refractive index changing composition and refra...
- Publication number 20030139486
- Publication date Jul 24, 2003
- JSR Corporation
- Kenji Yamada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Keiji Konno

Person

Patents Grantslast 30 patents

Composition for resist underlayer film and process for producing same

Composition for resist underlayer film and process for producing same

Pattern-forming method

Composition for forming antireflection film, layered product, and m...

Composition for forming antireflection film, laminate, and method f...

Acenaphthylene derivative, polymer, and antireflection film-forming...

Radiation sensitive refractive index changing composition and refra...

Composition for film formation, method of film formation, and insul...

Film-forming composition

Process for producing phenylene-containing polymer and film-forming...

Patents Applicationslast 30 patents

PATTERN-FORMING METHOD

INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION

COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME

COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME

Composition For Forming Antireflection Film, Layered Product, And M...

Composition for forming antireflection film, laminate, and method f...

Acenaphthylene derivative, polymer, and antireflection film-forming...

Radiation sensitive refractive index changing composition and refra...