Keiki Ito

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and filter unit
- Patent number 10,074,519
- Issue date Sep 11, 2018
- Tokyo Electron Limited
- Keiki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply system, plasma processing apparatus and power supply c...
- Patent number 10,056,230
- Issue date Aug 21, 2018
- Tokyo Electron Limited
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply unit, substrate processing apparatus and supply gas sett...
- Patent number 9,441,791
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Kenetsu Mizusawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply unit, substrate processing apparatus and supply gas sett...
- Patent number 8,906,193
- Issue date Dec 9, 2014
- Tokyo Electron Limited
- Kenetsu Mizusawa
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Flow rate control system and shower plate used for partial pressure...
- Patent number 8,109,288
- Issue date Feb 7, 2012
- Tokyo Electron Limited
- Hideki Nagaoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Partial pressure control system, flow rate control system and showe...
- Patent number 7,481,240
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Grant
Magnetron plasma processing system
- Patent number 5,554,249
- Issue date Sep 10, 1996
- Tokyo Electron Limited
- Makoto Hasegawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY C...
- Publication number 20160284514
- Publication date Sep 29, 2016
- TOKYO ELECTRON LIMITED
- Taichi Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILTER UNIT
- Publication number 20150235809
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Keiki Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY UNIT, SUBSTRATE PROCESSING APPARATUS AND SUPPLY GAS SETT...
- Publication number 20130092322
- Publication date Apr 18, 2013
- TOKYO ELECTRON LIMITED
- Kenetsu Mizusawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY UNIT, SUBSTRATE PROCESSING APPARATUS AND SUPPLY GAS SETT...
- Publication number 20100163112
- Publication date Jul 1, 2010
- TOKYO ELECTRON LIMITED
- Kenetsu Mizusawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Flow rate control system and shower plate used for partial pressure...
- Publication number 20080300728
- Publication date Dec 4, 2008
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas supply unit, substrate processing apparatus, and supply gas set...
- Publication number 20060124169
- Publication date Jun 15, 2006
- TOKYO ELECTRON LIMITED
- Kenetsu Mizusawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Application
Partial pressure control system, flow rate control system and showe...
- Publication number 20050029369
- Publication date Feb 10, 2005
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Plasma processing apparatus and filter unit

Power supply system, plasma processing apparatus and power supply c...

Gas supply unit, substrate processing apparatus and supply gas sett...

Gas supply unit, substrate processing apparatus and supply gas sett...

Flow rate control system and shower plate used for partial pressure...

Partial pressure control system, flow rate control system and showe...

Relative pressure control system and relative flow control system

Magnetron plasma processing system

Patents Applicationslast 30 patents

POWER SUPPLY SYSTEM, PLASMA PROCESSING APPARATUS AND POWER SUPPLY C...

PLASMA PROCESSING APPARATUS AND FILTER UNIT

GAS SUPPLY UNIT, SUBSTRATE PROCESSING APPARATUS AND SUPPLY GAS SETT...

GAS SUPPLY UNIT, SUBSTRATE PROCESSING APPARATUS AND SUPPLY GAS SETT...

Flow rate control system and shower plate used for partial pressure...

Gas supply unit, substrate processing apparatus, and supply gas set...

Relative pressure control system and relative flow control system

Partial pressure control system, flow rate control system and showe...