Keiko Hada

Person

Nirasaki-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning apparatus and substrate cleaning method
- Patent number 11,557,493
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Toshimitsu Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing oxygen-containing workpiece
- Patent number 11,548,804
- Issue date Jan 10, 2023
- Tokyo Electron Limited
- Reiko Sasahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and sub...
- Patent number 10,903,083
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Keiko Hada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle collecting apparatus and particle collecting method
- Patent number 10,213,076
- Issue date Feb 26, 2019
- Tokyo Electron Limited
- Nobuhiro Takahashi
- G01 - MEASURING TESTING
Information Patent Grant
Evaluating method of hydrophobic process, forming method of resist...
- Patent number 6,617,095
- Issue date Sep 9, 2003
- Tokyo Electron Limited
- Junichi Kitano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20220068657
- Publication date Mar 3, 2022
- Tokyo Electron Limited
- Koji TAKEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20210159096
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Toshimitsu SAKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20210104412
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Keiko HADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING OXYGEN-CONTAINING WORKPIECE
- Publication number 20200048134
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Reiko SASAHARA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...
- Publication number 20170200618
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Keiko HADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE COLLECTING APPARATUS AND PARTICLE COLLECTING METHOD
- Publication number 20130074281
- Publication date Mar 28, 2013
- TOKYO ELECTRON LIMITED
- Nobuhiro TAKAHASHI
- A47 - FURNITURE DOMESTIC ARTICLES OR APPLIANCES COFFEE MILLS SPICE MILLS SUCT...
Information Patent Application
Evaluating method of hydrophobic process, forming method of resist...
- Publication number 20020009592
- Publication date Jan 24, 2002
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Substrate cleaning apparatus and substrate cleaning method

Method and apparatus for processing oxygen-containing workpiece

Substrate processing method, substrate processing apparatus and sub...

Particle collecting apparatus and particle collecting method

Evaluating method of hydrophobic process, forming method of resist...

Patents Applicationslast 30 patents

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

METHOD AND APPARATUS FOR PROCESSING OXYGEN-CONTAINING WORKPIECE

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND SUB...

PARTICLE COLLECTING APPARATUS AND PARTICLE COLLECTING METHOD

Evaluating method of hydrophobic process, forming method of resist...