Keishi TSUKIYAMA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 12,298,660
- Issue date May 13, 2025
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,124,164
- Issue date Oct 22, 2024
- AGC Inc.
- Daijiro Akagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, reflective mask for EUV...
- Patent number 11,953,822
- Issue date Apr 9, 2024
- AGC Inc.
- Hirotomo Kawahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20250216765
- Publication date Jul 3, 2025
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING...
- Publication number 20250155793
- Publication date May 15, 2025
- AGC Inc.
- Ryosuke SEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PRODUCING MAGNETIC PARTICLES, MAGNETIC PARTICLES, AND PE...
- Publication number 20250065403
- Publication date Feb 27, 2025
- AGC Inc.
- Yasunari ISHIKAWA
- B22 - CASTING POWDER METALLURGY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20250004360
- Publication date Jan 2, 2025
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240241433
- Publication date Jul 18, 2024
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20240210814
- Publication date Jun 27, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20230324785
- Publication date Oct 12, 2023
- AGC Inc.
- Hirotomo KAWAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Keishi TSUKIYAMA

Person

Patents Grantslast 30 patents

Reflective mask blank for EUV lithography, reflective mask for EUV...

Reflective mask blank and reflective mask

Reflective mask blank for EUV lithography, reflective mask for EUV...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, METHOD FOR MANUFACTURING...

METHOD FOR PRODUCING MAGNETIC PARTICLES, MAGNETIC PARTICLES, AND PE...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...