Keisuke Egashira

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,998,186
- Issue date May 4, 2021
- Tokyo Electron Limited
- Gentaro Goshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning substrate processing apparatus and system of cle...
- Patent number 10,950,465
- Issue date Mar 16, 2021
- Tokyo Electron Limited
- Shotaro Kitayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing method, substrate processing apparatus, and stora...
- Patent number 10,867,814
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Yosuke Kawabuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,692,739
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Yosuke Kawabuchi
- F26 - DRYING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,576,493
- Issue date Mar 3, 2020
- Tokyo Electron Limited
- Keisuke Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,566,182
- Issue date Feb 18, 2020
- Tokyo Electron Limited
- Gentaro Goshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and st...
- Patent number 10,504,718
- Issue date Dec 10, 2019
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, and re...
- Patent number 10,395,950
- Issue date Aug 27, 2019
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,366,877
- Issue date Jul 30, 2019
- Tokyo Electron Limited
- Keisuke Egashira
- B08 - CLEANING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,325,771
- Issue date Jun 18, 2019
- Tokyo Electron Limited
- Keisuke Egashira
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus having nozzle with multiple f...
- Patent number 9,922,849
- Issue date Mar 20, 2018
- Tokyo Electron Limited
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,865,452
- Issue date Jan 9, 2018
- Tokyo Electron Limited
- Kotaro Oishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, etching apparatus and storage medium
- Patent number 8,969,218
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200144052
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200020550
- Publication date Jan 16, 2020
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180264504
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Keisuke Egashira
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180254200
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Yosuke Kawabuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180254180
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS AND SYSTEM OF CLE...
- Publication number 20180158699
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Shotaro Kitayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20180138058
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Keisuke Egashira
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20180138035
- Publication date May 17, 2018
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...
- Publication number 20180130675
- Publication date May 10, 2018
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20170256397
- Publication date Sep 7, 2017
- TOKYO ELECTRON LIMITED
- Gentaro Goshi
- B08 - CLEANING
Information Patent Application
LIQUID PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND STORA...
- Publication number 20170236729
- Publication date Aug 17, 2017
- TOKYO ELECTRON LIMITED
- Yosuke Kawabuchi
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20170103881
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Keisuke Egashira
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING LIQU...
- Publication number 20170092484
- Publication date Mar 30, 2017
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160300710
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Kotaro Oishi
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150318183
- Publication date Nov 5, 2015
- TOKYO ELECTRON LIMITED
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM
- Publication number 20120264308
- Publication date Oct 18, 2012
- TOKYO ELECTRON LIMITED
- Tsukasa WATANABE
- H01 - BASIC ELECTRIC ELEMENTS

Keisuke Egashira

Person

Patents Grantslast 30 patents

Substrate processing apparatus, substrate processing method, and st...

Method of cleaning substrate processing apparatus and system of cle...

Liquid processing method, substrate processing apparatus, and stora...

Substrate processing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus, substrate processing method, and st...

Substrate processing apparatus, substrate processing method, and re...

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Substrate liquid processing apparatus having nozzle with multiple f...

Substrate processing method and substrate processing apparatus

Etching method, etching apparatus and storage medium

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS AND SYSTEM OF CLE...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RE...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

LIQUID PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND STORA...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING LIQU...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM