Keisuke FUJITA

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device and substrate process...
- Patent number 12,131,947
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon film forming method and substrate processing apparatus
- Patent number 11,600,490
- Issue date Mar 7, 2023
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,410,847
- Issue date Aug 9, 2022
- Tokyo Electron Limited
- Hiroyuki Hayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming semiconductor film and film forming device
- Patent number 11,114,297
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Rui Kanemura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon film forming method and substrate processing apparatus
- Patent number 10,892,162
- Issue date Jan 12, 2021
- Tokyo Electron Limited
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus, film forming method and heat insulating member
- Patent number 10,570,508
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220364228
- Publication date Nov 17, 2022
- Tokyo Electron Limited
- Yoshihiro TAKEZAWA
- B08 - CLEANING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...
- Publication number 20220238374
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Yutaka Motoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210090887
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200312677
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Yoshihiro TAKEZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200312661
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Hiroyuki HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Forming Method and Film Forming Apparatus
- Publication number 20200308696
- Publication date Oct 1, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Semiconductor Film and Film Forming Device
- Publication number 20200168455
- Publication date May 28, 2020
- TOKYO ELECTRON LIMITED
- Rui KANEMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20190309420
- Publication date Oct 10, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190272995
- Publication date Sep 5, 2019
- TOKYO ELECTRON LIMITED
- Mitsuhiro Okada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20190228992
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Masami OIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER
- Publication number 20180179625
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Satoshi TAKAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Keisuke FUJITA

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor device and substrate process...

Silicon film forming method and substrate processing apparatus

Film forming method and film forming apparatus

Method for forming semiconductor film and film forming device

Silicon film forming method and substrate processing apparatus

Film forming apparatus, film forming method and heat insulating member

Patents Applicationslast 30 patents

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESS...

SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

Film Forming Method and Film Forming Apparatus

Method for Forming Semiconductor Film and Film Forming Device

Substrate Processing Apparatus and Substrate Processing Method

SILICON FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING APPARATUS, FILM FORMING METHOD AND HEAT INSULATING MEMBER