Keisuke Hashimoto

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition including cyclic carbony...
- Patent number 12,072,630
- Issue date Aug 27, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition that contains triaryldia...
- Patent number 12,025,916
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing amide solvent
- Patent number 11,798,810
- Issue date Oct 24, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 11,720,024
- Issue date Aug 8, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 11,681,223
- Issue date Jun 20, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stepped substrate coating composition containing compound having cu...
- Patent number 11,674,051
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 11,650,505
- Issue date May 16, 2023
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising carbonyl-cont...
- Patent number 11,592,747
- Issue date Feb 28, 2023
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition using a fluorene compound
- Patent number 11,506,980
- Issue date Nov 22, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level substrate coating film-forming composition containing p...
- Patent number 11,385,546
- Issue date Jul 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor substrate having group-III n...
- Patent number 11,339,242
- Issue date May 24, 2022
- NISSAN CHEMICAL CORPORATION
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing triaryldiamin...
- Patent number 11,300,879
- Issue date Apr 12, 2022
- NISSAN CHEMICAL CORPORATION
- Daigo Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing naphthol aral...
- Patent number 11,199,775
- Issue date Dec 14, 2021
- NISSAN CHEMICAL CORPORATION
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac polym...
- Patent number 11,199,777
- Issue date Dec 14, 2021
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming resist underlayer film, resist underlayer f...
- Patent number 11,169,441
- Issue date Nov 9, 2021
- NISSAN CHEMICAL CORPORATION
- Daigo Saito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming film protecting against aqueous hydrogen pe...
- Patent number 10,894,887
- Issue date Jan 19, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stepped substrate-coating composition containing polyether resin ha...
- Patent number 10,871,712
- Issue date Dec 22, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing substituted c...
- Patent number 10,809,619
- Issue date Oct 20, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for roughening surface using wet treatment
- Patent number 10,804,111
- Issue date Oct 13, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film forming composition
- Patent number 10,585,353
- Issue date Mar 10, 2020
- NISSAN CHEMICAL CORPORATION
- Hirokazu Nishimaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist underlayer film
- Patent number 10,551,737
- Issue date Feb 4, 2020
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Underlying coating forming composition for lithography containing c...
- Patent number 10,509,320
- Issue date Dec 17, 2019
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing polymer havin...
- Patent number 10,394,124
- Issue date Aug 27, 2019
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 10,191,374
- Issue date Jan 29, 2019
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Novolac resin-containing resist underlayer film-forming composition...
- Patent number 10,017,664
- Issue date Jul 10, 2018
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 9,746,772
- Issue date Aug 29, 2017
- Nissan Chemical Industries, Ltd.
- Hiroaki Okuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming organic hard mask layer for use in lithogra...
- Patent number 9,514,949
- Issue date Dec 6, 2016
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition that contains novolac re...
- Patent number 9,469,777
- Issue date Oct 18, 2016
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20240006183
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20230324802
- Publication date Oct 12, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20230244141
- Publication date Aug 3, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20230112897
- Publication date Apr 13, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20220404707
- Publication date Dec 22, 2022
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20210311396
- Publication date Oct 7, 2021
- NISSAN CHEMICAL CORPORATION
- Hiroto OGATA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20210271169
- Publication date Sep 2, 2021
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING CYCLIC CARBONY...
- Publication number 20210124268
- Publication date Apr 29, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUB...
- Publication number 20210116814
- Publication date Apr 22, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20210054231
- Publication date Feb 25, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...
- Publication number 20210024773
- Publication date Jan 28, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT CONTAINS TRIARYLDIA...
- Publication number 20200387072
- Publication date Dec 10, 2020
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND
- Publication number 20200379350
- Publication date Dec 3, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...
- Publication number 20200379352
- Publication date Dec 3, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...
- Publication number 20200301278
- Publication date Sep 24, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...
- Publication number 20200142310
- Publication date May 7, 2020
- NISSAN CHEMICAL CORPORATION
- Daigo SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...
- Publication number 20200131376
- Publication date Apr 30, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20200124966
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20190354018
- Publication date Nov 21, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARAL...
- Publication number 20190302616
- Publication date Oct 3, 2019
- NISSAN CHEMICAL CORPORATION
- Ryo KARASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20190294046
- Publication date Sep 26, 2019
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...
- Publication number 20190225731
- Publication date Jul 25, 2019
- NISSAN CHEMICAL CORPORATION
- Keisuke HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING TRIARYLDIAMIN...
- Publication number 20190212649
- Publication date Jul 11, 2019
- NISSAN CHEMICAL CORPORATION
- Daigo SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20190171101
- Publication date Jun 6, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH IMPROVED FILM D...
- Publication number 20190137878
- Publication date May 9, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR ROUGHENING SURFACE USING WET TREATMENT
- Publication number 20190092681
- Publication date Mar 28, 2019
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...
- Publication number 20190079397
- Publication date Mar 14, 2019
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20180356732
- Publication date Dec 13, 2018
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20180046078
- Publication date Feb 15, 2018
- Nissan Chemical Industries, Ltd.
- Ryo KARASAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVIN...
- Publication number 20170315445
- Publication date Nov 2, 2017
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Keisuke Hashimoto

Person

Patents Grantslast 30 patents

Photocurable composition and method for producing semiconductor device

Resist underlayer film-forming composition containing novolac resin...

Resist underlayer film-forming composition including cyclic carbony...

Resist underlayer film-forming composition that contains triaryldia...

Resist underlayer film-forming composition containing amide solvent

Resist underlayer film-forming composition containing indolocarbazo...

Photocurable composition and method for producing semiconductor device

Stepped substrate coating composition containing compound having cu...

Resist underlayer film-forming composition containing novolac resin...

Resist underlayer film-forming composition comprising carbonyl-cont...

Resist underlayer film forming composition using a fluorene compound

Multi-level substrate coating film-forming composition containing p...

Method for manufacturing semiconductor substrate having group-III n...

Resist underlayer film forming composition containing triaryldiamin...

Resist underlayer film-forming composition containing naphthol aral...

Resist underlayer film-forming composition containing novolac polym...

Composition for forming resist underlayer film, resist underlayer f...

Composition for forming film protecting against aqueous hydrogen pe...

Stepped substrate-coating composition containing polyether resin ha...

Resist underlayer film-forming composition containing substituted c...

Method for roughening surface using wet treatment

Resist underlayer film forming composition

Method for forming resist underlayer film

Underlying coating forming composition for lithography containing c...

Resist underlayer film-forming composition containing polymer havin...

Resist underlayer film-forming composition

Novolac resin-containing resist underlayer film-forming composition...

Resist underlayer film forming composition for lithography containi...

Composition for forming organic hard mask layer for use in lithogra...

Resist underlayer film forming composition that contains novolac re...

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING CYCLIC CARBONY...

RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUB...

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

STEPPED SUBSTRATE COATING COMPOSITION CONTAINING COMPOUND HAVING CU...

RESIST UNDERLAYER FILM-FORMING COMPOSITION THAT CONTAINS TRIARYLDIA...

RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...

STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...

COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...

MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARAL...

RESIST UNDERLAYER FILM FORMING COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE HAVING GROUP-III N...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING TRIARYLDIAMIN...

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM WITH IMPROVED FILM D...

METHOD FOR ROUGHENING SURFACE USING WET TREATMENT

STEPPED SUBSTRATE COATING COMPOSITION INCLUDING COMPOUND HAVING PHO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

METHOD FOR FORMING RESIST UNDERLAYER FILM

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVIN...