Keisuke KATO

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Yokohama-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Resist copolymer and resist composition
- Patent number 9,540,468
- Issue date Jan 10, 2017
- Mitsubishi Rayon Co., Ltd.
- Keisuke Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COPOLYMER AND RESIST COMPOSITION
- Publication number 20140371412
- Publication date Dec 18, 2014
- Mitsubishi Rayon Co., Ltd.
- Keisuke KATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...