Keisuke Kuriyama

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing structure having recessed pattern, resin c...
- Patent number 10,392,699
- Issue date Aug 27, 2019
- JSR Corporation
- Hitoshi Hamaguchi
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Thin film transistor and MOS field effect transistor that include h...
- Patent number 10,032,920
- Issue date Jul 24, 2018
- JSR Corporation
- Hitoshi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing substrate having wiring, radiation-sensitive...
- Patent number 9,980,392
- Issue date May 22, 2018
- JSR Corporation
- Hitoshi Hamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing substrate having concave pattern, composit...
- Patent number 9,746,775
- Issue date Aug 29, 2017
- JSR Corporation
- Hitoshi Hamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming three-dimensional interconnection, circuit arran...
- Patent number 9,543,201
- Issue date Jan 10, 2017
- JSR Corporation
- Kenzou Ookita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 8,053,521
- Issue date Nov 8, 2011
- JSR Corporation
- Takahiro Okamoto
- B24 - GRINDING POLISHING
Information Patent Grant
Resin composition, cured product and optical parts
- Patent number 7,714,096
- Issue date May 11, 2010
- Tokyo Institute of Technology
- Mitsuru Ueda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemical mechanical polishing pad and chemical mechanical polishing...
- Patent number 7,357,703
- Issue date Apr 15, 2008
- JSR Corporation
- Hideki Nishimura
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN C...
- Publication number 20170306481
- Publication date Oct 26, 2017
- JSR Corporation
- Hitoshi HAMAGUCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
THIN FILM TRANSISTOR AND MOS FIELD EFFECT TRANSISTOR THAT INCLUDE H...
- Publication number 20170243980
- Publication date Aug 24, 2017
- JSR Corporation
- Hitoshi HAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCING SUBSTRATE HAVING WIRING, RADIATION-SENSITIVE...
- Publication number 20170042038
- Publication date Feb 9, 2017
- JSR Corporation
- Hitoshi HAMAGUCHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSIT...
- Publication number 20160062242
- Publication date Mar 3, 2016
- JSR CORPORATION
- Hitoshi HAMAGUCHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR FORMING THREE-DIMENSIONAL INTERCONNECTION, CIRCUIT ARRAN...
- Publication number 20160064280
- Publication date Mar 3, 2016
- JSR Corporation
- Kenzou OOKITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS
- Publication number 20100137490
- Publication date Jun 3, 2010
- Tokyo Institute of Technology
- Mitsuru Ueda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD
- Publication number 20090036045
- Publication date Feb 5, 2009
- JSR Corporation
- Takahiro Okamoto
- B24 - GRINDING POLISHING
Information Patent Application
RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS
- Publication number 20080255284
- Publication date Oct 16, 2008
- Tokyo Institute of Technology
- Mitsuru Ueda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...
- Publication number 20070149096
- Publication date Jun 28, 2007
- JSR Corporation
- Hideki Nishimura
- B24 - GRINDING POLISHING

Keisuke Kuriyama

Person

Patents Grantslast 30 patents

Method for manufacturing structure having recessed pattern, resin c...

Thin film transistor and MOS field effect transistor that include h...

Process for producing substrate having wiring, radiation-sensitive...

Method for manufacturing substrate having concave pattern, composit...

Method for forming three-dimensional interconnection, circuit arran...

Chemical mechanical polishing pad

Resin composition, cured product and optical parts

Chemical mechanical polishing pad and chemical mechanical polishing...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN C...

THIN FILM TRANSISTOR AND MOS FIELD EFFECT TRANSISTOR THAT INCLUDE H...

PROCESS FOR PRODUCING SUBSTRATE HAVING WIRING, RADIATION-SENSITIVE...

METHOD FOR MANUFACTURING SUBSTRATE HAVING CONCAVE PATTERN, COMPOSIT...

METHOD FOR FORMING THREE-DIMENSIONAL INTERCONNECTION, CIRCUIT ARRAN...

RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS

CHEMICAL MECHANICAL POLISHING PAD

RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS

CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING...