Keisuke Nakayama

Person

Toyama-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for forming anti-reflective coat
- Patent number 7,947,424
- Issue date May 24, 2011
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,846,638
- Issue date Dec 7, 2010
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sulfur atom-containing anti-reflective coating forming composition...
- Patent number 7,795,369
- Issue date Sep 14, 2010
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective coating containing sulfur atom
- Patent number 7,501,229
- Issue date Mar 10, 2009
- Nissan Chemical Industries, Ltd.
- Yoshiomi Hiroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming anti-reflective coating for use in lithography
- Patent number 7,425,399
- Issue date Sep 16, 2008
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-reflective compositions comprising triazine compounds
- Patent number 7,038,328
- Issue date May 2, 2006
- Brewer Science Inc.
- Tomoyuki Enomoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for preparing an aqueous solution of sulfanilic acid modifi...
- Patent number 6,458,870
- Issue date Oct 1, 2002
- Nissan Chemical Industries, Ltd.
- Jun Uchida
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Process for preparing an aqueous solution of sulfanilic acid modifi...
- Patent number 6,214,965
- Issue date Apr 10, 2001
- Nissan Chemical Industries, Ltd.
- Jun Uchida
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Amino resin composition
- Patent number 5,998,573
- Issue date Dec 7, 1999
- Nissan Chemical Industries, Ltd.
- Makoto Takakura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Composition for forming anti-reflective coating for use in lithography
- Publication number 20080206680
- Publication date Aug 28, 2008
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sulfur Atom-Containing Anti-Reflective Coating Forming Composition...
- Publication number 20080118870
- Publication date May 22, 2008
- Nissan Chemical Industries, Ltd.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for antireflection film formation
- Publication number 20050175927
- Publication date Aug 11, 2005
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Anti-reflective compositions comprising triazine compounds
- Publication number 20040072420
- Publication date Apr 15, 2004
- BREWER SCIENCE, INC.
- Tomoyuki Enomoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Keisuke Nakayama

Person

Patents Grantslast 30 patents

Composition for forming anti-reflective coat

Composition for forming anti-reflective coating for use in lithography

Sulfur atom-containing anti-reflective coating forming composition...

Anti-reflective coating containing sulfur atom

Composition for forming anti-reflective coating for use in lithography

Anti-reflective compositions comprising triazine compounds

Process for preparing an aqueous solution of sulfanilic acid modifi...

Process for preparing an aqueous solution of sulfanilic acid modifi...

Amino resin composition

Patents Applicationslast 30 patents

Composition for forming anti-reflective coating for use in lithography

Sulfur Atom-Containing Anti-Reflective Coating Forming Composition...

Composition for antireflection film formation

Anti-reflective compositions comprising triazine compounds