Keita Ishiduka

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,040,220
- Issue date May 26, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and method of producing the same, acid generator, resist c...
- Patent number 9,034,556
- Issue date May 19, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for formation of resist protection film, and method for...
- Patent number 8,409,781
- Issue date Apr 2, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 8,338,076
- Issue date Dec 25, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 8,329,838
- Issue date Dec 11, 2012
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming resist protection films and method for resist...
- Patent number 8,278,025
- Issue date Oct 2, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound and method of producing same, acid generator, resist compo...
- Patent number 8,252,505
- Issue date Aug 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, and novel com...
- Patent number 8,247,160
- Issue date Aug 21, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,211,616
- Issue date Jul 3, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 8,198,004
- Issue date Jun 12, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Material for formation of protective film, method for formation of...
- Patent number 8,097,397
- Issue date Jan 17, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, acid generator, resist composition and method of forming...
- Patent number 7,955,777
- Issue date Jun 7, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Norbornene-type polymers, compositions thereof and lithographic pro...
- Patent number 7,799,883
- Issue date Sep 21, 2010
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 7,776,510
- Issue date Aug 17, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, manufacturing method thereof, acid generator, resist comp...
- Patent number 7,745,097
- Issue date Jun 29, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, novel compoun...
- Patent number 7,713,679
- Issue date May 11, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition
- Patent number 7,541,138
- Issue date Jun 2, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,527,909
- Issue date May 5, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,501,220
- Issue date Mar 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, method of forming resist pattern, compound and...
- Patent number 7,488,568
- Issue date Feb 10, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20120164580
- Publication date Jun 28, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...
- Publication number 20110065878
- Publication date Mar 17, 2011
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PROTECTIVE FILM-FORMING MATERIAL AND METHOD OF PHOTORESIST PATTERNI...
- Publication number 20110053097
- Publication date Mar 3, 2011
- Keita ISHIDUKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Protective film-removing solvent and method of photoresist patterni...
- Publication number 20100151395
- Publication date Jun 17, 2010
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition, method of forming resist pattern, novel compoun...
- Publication number 20100136478
- Publication date Jun 3, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...
- Publication number 20100124720
- Publication date May 20, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...
- Publication number 20100086879
- Publication date Apr 8, 2010
- Toshikazu Takayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR...
- Publication number 20100040973
- Publication date Feb 18, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20100015553
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroaki Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COM...
- Publication number 20100015555
- Publication date Jan 21, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki UTSUMI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...
- Publication number 20090280431
- Publication date Nov 12, 2009
- TOKYO OHKA KOGYO CO., LTD.
- Tomoyuki Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST...
- Publication number 20090208871
- Publication date Aug 20, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FO...
- Publication number 20090162787
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takehiro Seshimo
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...
- Publication number 20090162788
- Publication date Jun 25, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20090130605
- Publication date May 21, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...
- Publication number 20090104563
- Publication date Apr 23, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST...
- Publication number 20090053646
- Publication date Feb 26, 2009
- Keita Ishiduka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACRYLIC COPOLYMER
- Publication number 20090048409
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kotaro Endo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIS...
- Publication number 20090023095
- Publication date Jan 22, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20080311522
- Publication date Dec 18, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Material for Forming Resist Protection Films and Method for Resist...
- Publication number 20080299503
- Publication date Dec 4, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Keita Ishiduka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...
- Publication number 20080248422
- Publication date Oct 9, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi Iwai
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION
- Publication number 20070190436
- Publication date Aug 16, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-type resist composition for liquid immersion lithography a...
- Publication number 20070190448
- Publication date Aug 16, 2007
- Keita Ishiduka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20070178394
- Publication date Aug 2, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Norbornene-type polymers, compositions thereof and lithographic pro...
- Publication number 20060234164
- Publication date Oct 19, 2006
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Norbornene-type polymers, compositions thereof and lithographic pro...
- Publication number 20060235174
- Publication date Oct 19, 2006
- Promerus LLC
- Larry F. Rhodes
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photoresist composition and method of forming resist pattern
- Publication number 20060154171
- Publication date Jul 13, 2006
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20050014090
- Publication date Jan 20, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Taku Hirayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Keita Ishiduka

Person

Patents Grantslast 30 patents

Compound and method of producing the same, acid generator, resist c...

Compound and method of producing the same, acid generator, resist c...

Composition for formation of resist protection film, and method for...

Resist composition, method of forming resist pattern, novel compoun...

Norbornene-type polymers, compositions thereof and lithographic pro...

Material for forming resist protection films and method for resist...

Compound and method of producing same, acid generator, resist compo...

Resist composition, method of forming resist pattern, and novel com...

Positive resist composition and method of forming resist pattern

Resist composition

Material for formation of protective film, method for formation of...

Compound, acid generator, resist composition and method of forming...

Norbornene-type polymers, compositions thereof and lithographic pro...

Resist composition, method of forming resist pattern, compound and...

Compound, manufacturing method thereof, acid generator, resist comp...

Resist composition, method of forming resist pattern, novel compoun...

Resist composition

Resist composition

Resist composition

Resist composition, method of forming resist pattern, compound and...

Patents Applicationslast 30 patents

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

Norbornene-Type Polymers, Compositions Thereof And Lithographic Pro...

PROTECTIVE FILM-FORMING MATERIAL AND METHOD OF PHOTORESIST PATTERNI...

Protective film-removing solvent and method of photoresist patterni...

Resist composition, method of forming resist pattern, novel compoun...

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...

MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF...

COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COM...

MATERIAL FOR PROTECTIVE FILM FORMATION, AND METHOD FOR PHOTORESIST...

NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST...

NOVEL COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FO...

NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RE...

RESIST COMPOSITION

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUN...

MATERIAL FOR PROTECTIVE FILM FORMATION AND METHOD OF FORMING RESIST...

ACRYLIC COPOLYMER

NOVEL COMPOUND, MANUFACTURING METHOD THEREOF, ACID GENERATOR, RESIS...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

Material for Forming Resist Protection Films and Method for Resist...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND...

RESIST COMPOSITION

Positive-type resist composition for liquid immersion lithography a...

RESIST COMPOSITION

Norbornene-type polymers, compositions thereof and lithographic pro...

Norbornene-type polymers, compositions thereof and lithographic pro...

Photoresist composition and method of forming resist pattern

Resist composition