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Keita Ishizuka
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Kanagawa, JP
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last 30 patents
Information
Patent Grant
Material for forming resist protective film and method for forming...
Patent number
7,951,523
Issue date
May 31, 2011
Tokyo Ohka Kogyo Co., Ltd.
Keita Ishizuka
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Material for formation of resist protection film and method of form...
Patent number
7,879,529
Issue date
Feb 1, 2011
Tokyo Ohka Kogyo Co., Ltd.
Kotaro Endo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Material for forming resist protective film for use in liquid immer...
Patent number
7,846,637
Issue date
Dec 7, 2010
Tokyo Ohka Kogyo Co., Ltd.
Keita Ishizuka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING...
Publication number
20090197199
Publication date
Aug 6, 2009
Tokyo Ohka Kogyo Co., LTD.
Keita Ishizuka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Material for Formation of Resist Protection Film and Method of Form...
Publication number
20080311523
Publication date
Dec 18, 2008
Kotaro Endo
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Material for Forming Resist Protective Film for Use in Liquid Immer...
Publication number
20080032202
Publication date
Feb 7, 2008
Keita Ishizuka
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...