Keith Fox

Person

Tigard, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
PECVD apparatus for in-situ deposition of film stacks
- Patent number 11,746,420
- Issue date Sep 5, 2023
- Novellus Systems, Inc.
- Pramod Subramonium
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing high deposition rate, thick tetraethyl orthos...
- Patent number 10,358,717
- Issue date Jul 23, 2019
- Lam Research Corporation
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD apparatus for in-situ deposition of film stacks
- Patent number 10,214,816
- Issue date Feb 26, 2019
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rapid chamber clean using concurrent in-situ and remote plasma sources
- Patent number 10,161,034
- Issue date Dec 25, 2018
- Lam Research Corporation
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for deposition of conformal films with catalysis assisted lo...
- Patent number 9,388,491
- Issue date Jul 12, 2016
- Novellus Systems, Inc.
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post-deposition soft annealing
- Patent number 9,165,788
- Issue date Oct 20, 2015
- Novellus Systems, Inc.
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PECVD deposition of smooth silicon films
- Patent number 9,117,668
- Issue date Aug 25, 2015
- Novellus Systems, Inc.
- Alice Hollister
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ deposition of film stacks
- Patent number 9,028,924
- Issue date May 12, 2015
- Novellus Systems, Inc.
- Jason Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tensile stressed doped amorphous silicon
- Patent number 8,895,415
- Issue date Nov 25, 2014
- Novellus Systems, Inc.
- Keith Fox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ deposition of film stacks
- Patent number 8,741,394
- Issue date Jun 3, 2014
- Novellus Systems, Inc.
- Jason Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Smooth silicon-containing films
- Patent number 8,709,551
- Issue date Apr 29, 2014
- Novellus Systems, Inc.
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma clean method for deposition chamber
- Patent number 8,591,659
- Issue date Nov 26, 2013
- Novellus Systems, Inc.
- Zhiyuan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming conductive carbon films by PECVD
- Patent number 8,563,414
- Issue date Oct 22, 2013
- Novellus Systems, Inc.
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for reducing UV and dielectric diffusion barrier interaction
- Patent number 8,173,537
- Issue date May 8, 2012
- Novellus Systems, Inc.
- Kaushik Chattopadhyay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing UV and dielectric diffusion barrier interaction through th...
- Patent number 8,124,522
- Issue date Feb 28, 2012
- Novellus Systems, Inc.
- Hui-Jung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing low-stress carbon-doped oxide films with impr...
- Patent number 7,695,765
- Issue date Apr 13, 2010
- Novellus Systems, Inc.
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improving mechanical properties of low dielectric consta...
- Patent number 7,622,400
- Issue date Nov 24, 2009
- Novellus Systems, Inc.
- Keith Fox
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20230366094
- Publication date Nov 16, 2023
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CHANNEL LIQUID DELIVERY SYSTEM FOR ADVANCED SEMICONDUCTOR APP...
- Publication number 20220139730
- Publication date May 5, 2022
- Miguel Benjamin VASQUEZ
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW STRESS FILMS FOR ADVANCED SEMICONDUCTOR APPLICATIONS
- Publication number 20220068636
- Publication date Mar 3, 2022
- LAM RESEARCH CORPORATION
- Reza Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20190376186
- Publication date Dec 12, 2019
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING HIGH DEPOSITION RATE, THICK TETRAETHYL ORTHOS...
- Publication number 20180305812
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAPID CHAMBER CLEAN USING CONCURRENT IN-SITU AND REMOTE PLASMA SOURCES
- Publication number 20180305814
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD DEPOSITION OF SMOOTH SILICON FILMS
- Publication number 20150325435
- Publication date Nov 12, 2015
- Novellus Systems, Inc.
- Alice G. Hollister
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20150013607
- Publication date Jan 15, 2015
- Novellus Systems, Inc.
- Jason Dirk Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TENSILE STRESSED DOPED AMORPHOUS SILICON
- Publication number 20140357064
- Publication date Dec 4, 2014
- Keith Fox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER
- Publication number 20140053867
- Publication date Feb 27, 2014
- Novellus Systems, Inc.
- Zhiyuan Fang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITION OF CONFORMAL FILMS WITH CATALYSIS ASSISTED LO...
- Publication number 20140023784
- Publication date Jan 23, 2014
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD DEPOSITION OF SMOOTH SILICON FILMS
- Publication number 20130316518
- Publication date Nov 28, 2013
- Alice HOLLISTER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST-DEPOSITION SOFT ANNEALING
- Publication number 20130267081
- Publication date Oct 10, 2013
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU DEPOSITION OF FILM STACKS
- Publication number 20130171834
- Publication date Jul 4, 2013
- Jason Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON NITRIDE FILMS FOR SEMICONDUCTOR DEVICE APPLICATIONS
- Publication number 20130157466
- Publication date Jun 20, 2013
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PECVD DEPOSITION OF SMOOTH POLYSILICON FILMS
- Publication number 20120142172
- Publication date Jun 7, 2012
- Keith FOX
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-Situ Deposition of Film Stacks
- Publication number 20110236594
- Publication date Sep 29, 2011
- Jason Haverkamp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Smooth Silicon-Containing Films
- Publication number 20110236600
- Publication date Sep 29, 2011
- Keith Fox
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

PECVD apparatus for in-situ deposition of film stacks

Method for depositing high deposition rate, thick tetraethyl orthos...

PECVD apparatus for in-situ deposition of film stacks

Rapid chamber clean using concurrent in-situ and remote plasma sources

Method for deposition of conformal films with catalysis assisted lo...

Post-deposition soft annealing

PECVD deposition of smooth silicon films

In-situ deposition of film stacks

Tensile stressed doped amorphous silicon

In-situ deposition of film stacks

Smooth silicon-containing films

Plasma clean method for deposition chamber

Methods for forming conductive carbon films by PECVD

Methods for reducing UV and dielectric diffusion barrier interaction

Reducing UV and dielectric diffusion barrier interaction through th...

Methods for producing low-stress carbon-doped oxide films with impr...

Method for improving mechanical properties of low dielectric consta...

Patents Applicationslast 30 patents

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

MULTI-CHANNEL LIQUID DELIVERY SYSTEM FOR ADVANCED SEMICONDUCTOR APP...

LOW STRESS FILMS FOR ADVANCED SEMICONDUCTOR APPLICATIONS

PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS

METHOD FOR DEPOSITING HIGH DEPOSITION RATE, THICK TETRAETHYL ORTHOS...

RAPID CHAMBER CLEAN USING CONCURRENT IN-SITU AND REMOTE PLASMA SOURCES

PECVD DEPOSITION OF SMOOTH SILICON FILMS

IN-SITU DEPOSITION OF FILM STACKS

TENSILE STRESSED DOPED AMORPHOUS SILICON

PLASMA CLEAN METHOD FOR DEPOSITION CHAMBER

METHOD FOR DEPOSITION OF CONFORMAL FILMS WITH CATALYSIS ASSISTED LO...

PECVD DEPOSITION OF SMOOTH SILICON FILMS

POST-DEPOSITION SOFT ANNEALING

IN-SITU DEPOSITION OF FILM STACKS

SILICON NITRIDE FILMS FOR SEMICONDUCTOR DEVICE APPLICATIONS

PECVD DEPOSITION OF SMOOTH POLYSILICON FILMS

In-Situ Deposition of Film Stacks

Smooth Silicon-Containing Films