Keith Frank Best

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Patents Grantslast 30 patents

Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,567,340
- Issue date Jul 28, 2009
- ASML Netherlands B.V.
- Cheng-Qun Gui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for 3D alignment in wafer scale integration
- Patent number 7,562,686
- Issue date Jul 21, 2009
- ASML Netherlands B.V.
- Keith Frank Best
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Device manufacturing method and a calibration substrate
- Patent number 7,501,215
- Issue date Mar 10, 2009
- ASML Netherlands B.V.
- Keith Frank Best
- A41 - WEARING APPAREL
Information Patent Grant
Substrate holder and device manufacturing method
- Patent number 7,494,828
- Issue date Feb 24, 2009
- ASML Netherlands B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Lithographic apparatus and method
- Publication number 20080117402
- Publication date May 22, 2008
- ASML NETHERLANDS B.V.
- Keith Frank Best
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080085462
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring the bonding of bonded substrates
- Publication number 20080083818
- Publication date Apr 10, 2008
- ASML NETHERLANDS B.V.
- Keith Frank Best
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Substrate holder and device manufacturing method
- Publication number 20070037077
- Publication date Feb 15, 2007
- ASML NETHERLANDS B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method and a calibration substrate
- Publication number 20060292463
- Publication date Dec 28, 2006
- ASML NETHERLANDS B.V.
- Keith Frank Best
- A41 - WEARING APPAREL
Information Patent Application
Method and system for 3D aligment in wafer scale integration
- Publication number 20060172507
- Publication date Aug 3, 2006
- ASML NETHERLANDS B.V.
- Keith Frank Best
- B81 - MICRO-STRUCTURAL TECHNOLOGY