Keiyu OU

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,216,404
- Issue date Feb 4, 2025
- FUJIFILM Corporation
- Masafumi Kojima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation sensitive resin composition, act...
- Patent number 11,073,762
- Issue date Jul 27, 2021
- FUJIFILM Corporation
- Daisuke Asakawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, method for producing electronic device, and...
- Patent number 10,859,914
- Issue date Dec 8, 2020
- FUJIFILM Corporation
- Naoya Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, ac...
- Patent number 10,649,329
- Issue date May 12, 2020
- FUJIFILM Corporation
- Shohei Kataoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, pa...
- Patent number 10,025,186
- Issue date Jul 17, 2018
- FUJIFILM Corporation
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,952,509
- Issue date Apr 24, 2018
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active light sensitive or radiation sensitive resin composition, pa...
- Patent number 9,791,777
- Issue date Oct 17, 2017
- FUJIFILM Corporation
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...
- Publication number 20220107561
- Publication date Apr 7, 2022
- FUJIFILM CORPORATION
- Keiyu OU
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210294217
- Publication date Sep 23, 2021
- FUJIFILM CORPORATION
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210271162
- Publication date Sep 2, 2021
- FUJIFILM CORPORATION
- Keiyu OU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210088905
- Publication date Mar 25, 2021
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20190294043
- Publication date Sep 26, 2019
- FUJIFILM CORPORATION
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20190196326
- Publication date Jun 27, 2019
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20180292751
- Publication date Oct 11, 2018
- FUJIFILM CORPORATION
- Daisuke ASAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANI...
- Publication number 20180120706
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Michihiro SHIRAKAWA
- B32 - LAYERED PRODUCTS
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...
- Publication number 20170322490
- Publication date Nov 9, 2017
- FUJIFILM CORPORATION
- Naoya HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING...
- Publication number 20170199455
- Publication date Jul 13, 2017
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING...
- Publication number 20170192355
- Publication date Jul 6, 2017
- FUJIFILM CORPORATION
- Masafumi KOJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PA...
- Publication number 20170168394
- Publication date Jun 15, 2017
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVI...
- Publication number 20170115571
- Publication date Apr 27, 2017
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...
- Publication number 20170097565
- Publication date Apr 6, 2017
- FUJIFILM CORPORATION
- Shohei KATAOKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PA...
- Publication number 20160347897
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160313645
- Publication date Oct 27, 2016
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHTRAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION...
- Publication number 20160223905
- Publication date Aug 4, 2016
- FUJIFILM CORPORATION
- Keiyu OU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation sensitive resin composition, act...

Pattern forming method, method for producing electronic device, and...

Active light sensitive or radiation sensitive resin composition, ac...

Active-light-sensitive or radiation-sensitive resin composition, pa...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Active light sensitive or radiation sensitive resin composition, pa...

Patents Applicationslast 30 patents

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

PATTERN FORMING METHOD, LAMINATE, AND RESIST COMPOSITION FOR ORGANI...

PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...

METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING...

METHOD FOR FORMING NEGATIVE TONE PATTERN, METHOD FOR MANUFACTURING...

ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PA...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVI...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AC...

ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PA...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTIVE LIGHTRAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION...