Ken ISHIBASHI

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20250044692
- Publication date Feb 6, 2025
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLYING FILM FORMATION
- Publication number 20240069441
- Publication date Feb 29, 2024
- NISSAN CHEMICAL CORPORATION
- Satoshi TAKEDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230176481
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLYING FILM
- Publication number 20230168582
- Publication date Jun 1, 2023
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20230152700
- Publication date May 18, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20230112897
- Publication date Apr 13, 2023
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...
- Publication number 20220373888
- Publication date Nov 24, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS
- Publication number 20220206395
- Publication date Jun 30, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220187709
- Publication date Jun 16, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20220177653
- Publication date Jun 9, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING COMPOSITION
- Publication number 20220100092
- Publication date Mar 31, 2022
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILM-FORMING COMPOSITION
- Publication number 20210395462
- Publication date Dec 23, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...
- Publication number 20210181635
- Publication date Jun 17, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM
- Publication number 20210054231
- Publication date Feb 25, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...
- Publication number 20210018840
- Publication date Jan 21, 2021
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...
- Publication number 20190265593
- Publication date Aug 29, 2019
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Ken ISHIBASHI

Person

Patents Grantslast 30 patents

Semiconductor device production method employing silicon-containing...

Patents Applicationslast 30 patents

SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION

COMPOSITION FOR RESIST UNDERLYING FILM FORMATION

FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING RESIST UNDERLYING FILM

FILM-FORMING COMPOSITION

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLU...

COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS

FILM-FORMING COMPOSITION

FILM-FORMING COMPOSITION

FILM FORMING COMPOSITION

FILM-FORMING COMPOSITION

SEMICONDUCTOR DEVICE PRODUCTION METHOD EMPLOYING SILICON-CONTAINING...

COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...