Ken Kobayashi

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,125,676
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,756,767
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Takahiro Takeuchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing target object and plasma processing apparatus
- Patent number 9,583,361
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Yoshihide Kihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,349,574
- Issue date May 24, 2016
- Tokyo Electron Limited
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014866
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH
- Publication number 20240379372
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Adam Pranda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Etching Features in a Layer in a Substrate
- Publication number 20240234158
- Publication date Jul 11, 2024
- TOKYO ELECTRON LIMITED
- Indroneil Roy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240222075
- Publication date Jul 4, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240105424
- Publication date Mar 28, 2024
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230360884
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of Polycrystalline Semiconductors
- Publication number 20230317462
- Publication date Oct 5, 2023
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220084788
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220084789
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Takahiro TAKEUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210358716
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Bongseong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210358717
- Publication date Nov 18, 2021
- TOKYO ELECTRON LIMITED
- Bongseong KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS
- Publication number 20150243524
- Publication date Aug 27, 2015
- TOKYO ELECTRON LIMITED
- Yoshihide Kihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20150206715
- Publication date Jul 23, 2015
- TOKYO ELECTRON LIMITED
- Ryoichi Yoshida
- H01 - BASIC ELECTRIC ELEMENTS

Ken Kobayashi

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Method of processing target object and plasma processing apparatus

Plasma etching method and plasma etching apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR ION-ASSISTED SELF-LIMITED CONFORMAL ETCH

Method for Etching Features in a Layer in a Substrate

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Etching of Polycrystalline Semiconductors

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

METHOD OF PROCESSING TARGET OBJECT AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS