Ken MacWilliams

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Double exposure patterning with carbonaceous hardmask
- Patent number 8,293,460
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hui W. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Air gap formation and integration using a patterning cap
- Patent number 7,811,924
- Issue date Oct 12, 2010
- Applied Materials, Inc.
- Zhenjiang Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion implanting insulator material to reduce dielectric c...
- Patent number 7,166,524
- Issue date Jan 23, 2007
- Applied Materials, Inc.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a low thermal budget spacer
- Patent number 7,049,200
- Issue date May 23, 2006
- Applied Materials Inc.
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUES AND SYSTEMS FOR FABRICATING ANTI-REFLECTIVE AND PASSIVAT...
- Publication number 20130045560
- Publication date Feb 21, 2013
- Graham T. MacWilliams
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER SiN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRY...
- Publication number 20110272024
- Publication date Nov 10, 2011
- Applied Materials, Inc.
- Dongwon Choi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK
- Publication number 20090311635
- Publication date Dec 17, 2009
- HUI W. CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AIR GAP FORMATION AND INTEGRATION USING A PATTERNING CAP
- Publication number 20090309230
- Publication date Dec 17, 2009
- ZHENJIANG CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...
- Publication number 20090004875
- Publication date Jan 1, 2009
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTED INSULATOR MATERIAL WITH REDUCED DIELECTRIC CONSTANT
- Publication number 20070042580
- Publication date Feb 22, 2007
- Amir Al-Bayati
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A LOW THERMAL BUDGET SPACER
- Publication number 20050266622
- Publication date Dec 1, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Reza Arghavani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for ion implanting insulator material to reduce dielectric c...
- Publication number 20050191828
- Publication date Sep 1, 2005
- APPLIED MATERIALS, INC.
- Amir Al-Bayati
- H01 - BASIC ELECTRIC ELEMENTS

Ken MacWilliams

Person

Patents Grantslast 30 patents

Double exposure patterning with carbonaceous hardmask

Air gap formation and integration using a patterning cap

Method for ion implanting insulator material to reduce dielectric c...

Method for forming a low thermal budget spacer

Patents Applicationslast 30 patents

TECHNIQUES AND SYSTEMS FOR FABRICATING ANTI-REFLECTIVE AND PASSIVAT...

MULTI-LAYER SiN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRY...

DOUBLE EXPOSURE PATTERNING WITH CARBONACEOUS HARDMASK

AIR GAP FORMATION AND INTEGRATION USING A PATTERNING CAP

METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...

ION IMPLANTED INSULATOR MATERIAL WITH REDUCED DIELECTRIC CONSTANT

METHOD FOR FORMING A LOW THERMAL BUDGET SPACER

Method for ion implanting insulator material to reduce dielectric c...