Ken MARUYAMA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 11,966,161
- Issue date Apr 23, 2024
- JSR Corporation
- Takuhiro Taniguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing film
- Patent number 11,745,216
- Issue date Sep 5, 2023
- JSR Corporation
- Ryo Kumegawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 11,747,725
- Issue date Sep 5, 2023
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 11,609,495
- Issue date Mar 21, 2023
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 11,592,746
- Issue date Feb 28, 2023
- JSR Corporation
- Kazuya Kiriyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, production method thereof, a...
- Patent number 11,319,388
- Issue date May 3, 2022
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, pattern-forming method and radiati...
- Patent number 11,204,552
- Issue date Dec 21, 2021
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern-forming method and composition for resist pattern-refinement
- Patent number 10,216,090
- Issue date Feb 26, 2019
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 9,304,393
- Issue date Apr 5, 2016
- JSR Corporation
- Kazuo Nakahara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Liquid immersion lithography upper-layer film-forming composition a...
- Patent number 9,261,789
- Issue date Feb 16, 2016
- JSR Corporation
- Takahiro Hayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition and compound
- Patent number 9,200,098
- Issue date Dec 1, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition and compound
- Patent number 9,128,370
- Issue date Sep 8, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, and radiation-sensitive acid...
- Patent number 9,122,154
- Issue date Sep 1, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, compound and producing metho...
- Patent number 9,120,726
- Issue date Sep 1, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,104,102
- Issue date Aug 11, 2015
- JSR Corporation
- Yasuhiko Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming resist pattern and composition for forming prote...
- Patent number 9,052,600
- Issue date Jun 9, 2015
- JSR Corporation
- Ken Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition, and compound
- Patent number 9,023,584
- Issue date May 5, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and compound
- Patent number 8,968,980
- Issue date Mar 3, 2015
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition and radiation-sensitive acid...
- Patent number 8,889,336
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,889,335
- Issue date Nov 18, 2014
- JSR Corporation
- Ken Maruyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer
- Patent number 8,809,476
- Issue date Aug 19, 2014
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition, monomer, polymer, and produc...
- Patent number 8,632,945
- Issue date Jan 21, 2014
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and polymer
- Patent number 8,470,513
- Issue date Jun 25, 2013
- JSR Corporation
- Kota Nishino
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, radiation-sensitive composition, monomer, and method of pr...
- Patent number 8,389,202
- Issue date Mar 5, 2013
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,377,627
- Issue date Feb 19, 2013
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, radiation-sensitive composition, monomer, and method of pr...
- Patent number 8,334,087
- Issue date Dec 18, 2012
- JSR Corporation
- Ken Maruyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound and radiation-sensitive composition
- Patent number 8,173,351
- Issue date May 8, 2012
- JSR Corporation
- Daisuke Shimizu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive composition, polymer and monomer
- Patent number 7,977,442
- Issue date Jul 12, 2011
- JSR Corporation
- Ken Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20240411228
- Publication date Dec 12, 2024
- JSR Corporation
- Ken MARUYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240385520
- Publication date Nov 21, 2024
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20240377742
- Publication date Nov 14, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240369928
- Publication date Nov 7, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20240329523
- Publication date Oct 3, 2024
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20240152050
- Publication date May 9, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240152048
- Publication date May 9, 2024
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20240126167
- Publication date Apr 18, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240030030
- Publication date Jan 25, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION
- Publication number 20240021429
- Publication date Jan 18, 2024
- JSR Corporation
- Ken MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240004288
- Publication date Jan 4, 2024
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20230400768
- Publication date Dec 14, 2023
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230341772
- Publication date Oct 26, 2023
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20230273519
- Publication date Aug 31, 2023
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...
- Publication number 20230259032
- Publication date Aug 17, 2023
- JSR Corporation
- Miki TAMADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230244143
- Publication date Aug 3, 2023
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20230236506
- Publication date Jul 27, 2023
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...
- Publication number 20230203229
- Publication date Jun 29, 2023
- JSR Corporation
- Miki TAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20230205082
- Publication date Jun 29, 2023
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING FILM
- Publication number 20230027151
- Publication date Jan 26, 2023
- JSR Corporation
- Ryo KUMEGAWA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20220382152
- Publication date Dec 1, 2022
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220334481
- Publication date Oct 20, 2022
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
- Publication number 20220299875
- Publication date Sep 22, 2022
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220269172
- Publication date Aug 25, 2022
- JSR Corporation
- Katsuaki Nishikori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20220252978
- Publication date Aug 11, 2022
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20220043350
- Publication date Feb 10, 2022
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210389667
- Publication date Dec 16, 2021
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210318613
- Publication date Oct 14, 2021
- JSR Corporation
- Katsuaki NISHIKORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20210263413
- Publication date Aug 26, 2021
- JSR Corporation
- Kazuya KIRIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210124263
- Publication date Apr 29, 2021
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY

Ken MARUYAMA

Person

Patents Grantslast 30 patents

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method of forming resist pat...

Method for producing film

Radiation-sensitive resin composition and method for forming resist...

Radiation-sensitive resin composition and resist pattern-forming me...

Radiation-sensitive resin composition, resist pattern-forming metho...

Radiation-sensitive resin composition, production method thereof, a...

Radiation-sensitive composition, pattern-forming method and radiati...

Pattern-forming method and composition for resist pattern-refinement

Radiation-sensitive resin composition and compound

Liquid immersion lithography upper-layer film-forming composition a...

Radiation-sensitive composition and compound

Radiation-sensitive composition and compound

Radiation-sensitive resin composition, and radiation-sensitive acid...

Radiation-sensitive resin composition, compound and producing metho...

Radiation-sensitive resin composition

Method for forming resist pattern and composition for forming prote...

Radiation-sensitive composition, and compound

Radiation-sensitive resin composition and compound

Radiation-sensitive resin composition and radiation-sensitive acid...

Radiation-sensitive resin composition

Polymer

Radiation-sensitive resin composition, monomer, polymer, and produc...

Radiation-sensitive resin composition and polymer

Polymer, radiation-sensitive composition, monomer, and method of pr...

Compound and radiation-sensitive composition

Polymer, radiation-sensitive composition, monomer, and method of pr...

Compound and radiation-sensitive composition

Radiation-sensitive composition, polymer and monomer

Patents Applicationslast 30 patents

PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATES

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPH...

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

METHOD FOR PRODUCING FILM

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...