Ken SAWABE

Person

Hitachi-shi, Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, photosensitive element, method fo...
- Patent number 10,564,543
- Issue date Feb 18, 2020
- Hitachi Chemical Company, Ltd.
- Shota Okade
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and photosensitive film using same
- Patent number 9,403,977
- Issue date Aug 2, 2016
- Hitachi Chemical Company, Ltd.
- Satoko Ueda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition and photosensitive element
- Patent number 8,034,529
- Issue date Oct 11, 2011
- Hitachi Chemical Company, Ltd.
- Ken Sawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-curable resin composition and a method for forming a pattern...
- Patent number 7,935,472
- Issue date May 3, 2011
- Hitachi Chemical Company, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin composition, photosensitive element, resist pa...
- Patent number 7,611,818
- Issue date Nov 3, 2009
- Hitachi Chemical Company, Ltd.
- Ken Sawabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for producing printed wiring board and photosensitive resin...
- Patent number 7,338,751
- Issue date Mar 4, 2008
- Hitachi Chemical Co., Ltd.
- Toshihiko Akahori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...
- Publication number 20170261851
- Publication date Sep 14, 2017
- Hitachi Chemical Company, Ltd.
- Shota OKADE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE FILM USING SAME
- Publication number 20150315379
- Publication date Nov 5, 2015
- Hitachi Chemical Company, Ltd.
- Satoko UEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT
- Publication number 20090214979
- Publication date Aug 27, 2009
- Ken Sawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive resin composition, photosensitive element, resist pa...
- Publication number 20070077514
- Publication date Apr 5, 2007
- Hitachi Chemical Company, Ltd.
- Ken Sawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photo-curable resin composition and a method for forming a pattern...
- Publication number 20070065757
- Publication date Mar 22, 2007
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for manufacturing printeed wiring board and photosensitive r...
- Publication number 20040086801
- Publication date May 6, 2004
- Toshihiko Akahori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Person

Patents Grantslast 30 patents

Photosensitive resin composition, photosensitive element, method fo...

Photosensitive resin composition and photosensitive film using same

Photosensitive resin composition and photosensitive element

Photo-curable resin composition and a method for forming a pattern...

Photosensitive resin composition, photosensitive element, resist pa...

Process for producing printed wiring board and photosensitive resin...

Patents Applicationslast 30 patents

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FO...

PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE FILM USING SAME

PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT

Photosensitive resin composition, photosensitive element, resist pa...

Photo-curable resin composition and a method for forming a pattern...

Method for manufacturing printeed wiring board and photosensitive r...