Ken Wu

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Hsinchu County, TW

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Patents Grantslast 30 patents

Information Patent Grant
Photomask and photomask substrate with reduced light scattering pro...
- Patent number 8,624,345
- Issue date Jan 7, 2014
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ken Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a robust mask with reduced light scattering
- Patent number 8,198,118
- Issue date Jun 12, 2012
- Taiwan Semiconductor Manufacturing Co.
- Ken Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for providing phase shift mask passivation layer
- Patent number 7,727,682
- Issue date Jun 1, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Ting Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK AND PHOTOMASK SUBSTRATE WITH REDUCED LIGHT SCATTERING PRO...
- Publication number 20120237861
- Publication date Sep 20, 2012
- Taiwan Semiconductor Manufacturing Co., LTD
- Ken Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Providing Phase Shift Mask Passivation Layer
- Publication number 20080233486
- Publication date Sep 25, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Ting Pan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming a robust mask with reduced light scattering
- Publication number 20080102379
- Publication date May 1, 2008
- Ken Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY