Ken Yoshioka

Person

Yamaguchi-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,378,929
- Issue date Jun 28, 2016
- Hitachi High-Technologies Corporation
- Kenji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,039,865
- Issue date May 26, 2015
- Hitachi High-Technologies Corporation
- Ken Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,951,385
- Issue date Feb 10, 2015
- Hitachi High-Technologies Corporation
- Kenji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,940,128
- Issue date Jan 27, 2015
- Hitachi High-Technologies Corporation
- Yusaku Sakka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,795,467
- Issue date Aug 5, 2014
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,282,848
- Issue date Oct 9, 2012
- Hitachi High-Technologies Corporation
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,231,759
- Issue date Jul 31, 2012
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method in plasma processing apparatus
- Patent number 8,092,637
- Issue date Jan 10, 2012
- Hitachi High-Technologies Corporation
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 8,083,889
- Issue date Dec 27, 2011
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,062,473
- Issue date Nov 22, 2011
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method
- Patent number 7,833,429
- Issue date Nov 16, 2010
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,744,721
- Issue date Jun 29, 2010
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,740,739
- Issue date Jun 22, 2010
- Hitachi High-Technologies Corporation
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 7,713,756
- Issue date May 11, 2010
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 7,608,162
- Issue date Oct 27, 2009
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and semiconductor manufacturing line us...
- Patent number 7,347,656
- Issue date Mar 25, 2008
- Hitachi, Ltd.
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 7,288,166
- Issue date Oct 30, 2007
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit arrangement fabrication method
- Patent number RE39895
- Issue date Oct 23, 2007
- Renesas Technology Corp.
- Takafumi Tokunaga
- 438 - Semiconductor device manufacturing: process
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,224,568
- Issue date May 29, 2007
- Hitachi High-Technologies Corporation
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and semiconductor manufacturing line us...
- Patent number 7,201,551
- Issue date Apr 10, 2007
- Hitachi, Ltd.
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a semiconductor processing apparatus
- Patent number 7,183,715
- Issue date Feb 27, 2007
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing method
- Patent number 7,138,606
- Issue date Nov 21, 2006
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing method of a specimen and surface processing appa...
- Patent number 7,049,243
- Issue date May 23, 2006
- Hitachi, Ltd.
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and semiconductor manufacturing line us...
- Patent number 6,962,472
- Issue date Nov 8, 2005
- Hitachi, Ltd.
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus and semiconductor manufacturing line us...
- Patent number 6,895,685
- Issue date May 24, 2005
- Hitachi, Ltd.
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer stage for wafer processing apparatus
- Patent number 6,895,179
- Issue date May 17, 2005
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing high-speed semiconductor...
- Patent number 6,867,144
- Issue date Mar 15, 2005
- Hitachi, Ltd.
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,850,012
- Issue date Feb 1, 2005
- Hitachi High-Technologies Corporation
- Manabu Edamura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,846,363
- Issue date Jan 25, 2005
- Hitachi, Ltd.
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method of hardly-etched material and semiconductor fabricat...
- Patent number 6,835,665
- Issue date Dec 28, 2004
- Hitachi High-Technologies Corporation
- Nobuyuki Mise
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20150221477
- Publication date Aug 6, 2015
- Hitachi High-Technologies Corporation
- Kenji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130267098
- Publication date Oct 10, 2013
- Kenji MAEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus
- Publication number 20120273136
- Publication date Nov 1, 2012
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20120000774
- Publication date Jan 5, 2012
- Ken Yoshioka
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110297320
- Publication date Dec 8, 2011
- Hitachi High-Technologies Corporation
- Yusaku Sakka
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110132540
- Publication date Jun 9, 2011
- Yusaku SAKKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110108194
- Publication date May 12, 2011
- Hitachi High-Technologies Corporation
- Ken YOSHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100294432
- Publication date Nov 25, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100263796
- Publication date Oct 21, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100078130
- Publication date Apr 1, 2010
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20100018649
- Publication date Jan 28, 2010
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20090321017
- Publication date Dec 31, 2009
- Tsunehiko Tsubone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus And Method For Plasma Etching
- Publication number 20090223633
- Publication date Sep 10, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum Processing Apparatus And Semiconductor Manufacturing Line Us...
- Publication number 20090220322
- Publication date Sep 3, 2009
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS
- Publication number 20090218316
- Publication date Sep 3, 2009
- Yutaka Kouzuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20090095423
- Publication date Apr 16, 2009
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20090078375
- Publication date Mar 26, 2009
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20080280451
- Publication date Nov 13, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080236614
- Publication date Oct 2, 2008
- Hitachi High-Technologies Corporation
- Mamoru YAKUSHIJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20080170969
- Publication date Jul 17, 2008
- Ken Yoshioka
- G05 - CONTROLLING REGULATING
Information Patent Application
VACUUM PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING LINE US...
- Publication number 20080138180
- Publication date Jun 12, 2008
- Minoru Soraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20080023145
- Publication date Jan 31, 2008
- Yutaka Ohmoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20080011425
- Publication date Jan 17, 2008
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus And Method
- Publication number 20080011716
- Publication date Jan 17, 2008
- Ryoji Nishio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sample holding electrode and a plasma processing apparatus using th...
- Publication number 20070209933
- Publication date Sep 13, 2007
- Ken Yoshioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA ETCHING
- Publication number 20070184563
- Publication date Aug 9, 2007
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20060175016
- Publication date Aug 10, 2006
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20060171093
- Publication date Aug 3, 2006
- Hiroaki Ishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20060032585
- Publication date Feb 16, 2006
- Yoshitaka Kai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050224182
- Publication date Oct 13, 2005
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS

Ken Yoshioka

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus and method

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Manufacturing method in plasma processing apparatus

Apparatus and method for plasma etching

Plasma processing apparatus and method

Plasma processing method

Plasma processing apparatus

Plasma processing apparatus and method

Apparatus and method for plasma etching

Plasma processing apparatus and method

Vacuum processing apparatus and semiconductor manufacturing line us...

Plasma processing apparatus

Semiconductor integrated circuit arrangement fabrication method

Plasma processing method and plasma processing apparatus

Vacuum processing apparatus and semiconductor manufacturing line us...

Method for operating a semiconductor processing apparatus

Wafer processing method

Surface processing method of a specimen and surface processing appa...

Vacuum processing apparatus and semiconductor manufacturing line us...

Vacuum processing apparatus and semiconductor manufacturing line us...

Wafer stage for wafer processing apparatus

Apparatus and method for plasma processing high-speed semiconductor...

Plasma processing apparatus

Plasma processing apparatus and method

Etching method of hardly-etched material and semiconductor fabricat...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma Processing Apparatus

Plasma Processing Apparatus

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus

Plasma Processing Apparatus

Plasma Processing Apparatus

Plasma Processing Apparatus And Method

Plasma Processing Apparatus and Plasma Processing Method

Apparatus And Method For Plasma Etching

Vacuum Processing Apparatus And Semiconductor Manufacturing Line Us...

MANUFACTURING METHOD IN PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR PLASMA ETCHING

Plasma Processing Apparatus And Method

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

VACUUM PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING LINE US...

PLASMA PROCESSING APPARATUS AND METHOD

Plasma Processing Apparatus And Method

Plasma Processing Apparatus And Method

Sample holding electrode and a plasma processing apparatus using th...

APPARATUS AND METHOD FOR PLASMA ETCHING

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and apparatus

Plasma processing apparatus