Kenichi Hanawa

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Nirasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus and method
- Patent number 10,861,678
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 10,229,815
- Issue date Mar 12, 2019
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and method
- Patent number 8,852,385
- Issue date Oct 7, 2014
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20190115192
- Publication date Apr 18, 2019
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20150000843
- Publication date Jan 1, 2015
- TOKYO ELECTRON LIMITED
- Akira KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20130119863
- Publication date May 16, 2013
- TOKYO ELECTRON LIMITED
- Kenichi HANAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH FREQUENCY POWER DISTRIBUTION DEVICE AND SUBSTRATE PROCESSING A...
- Publication number 20120312473
- Publication date Dec 13, 2012
- TOKYO ELECTRON LIMITED
- Kenichi Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20080110859
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS