Kenichi Kawashima

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating a semiconductor device using a CMP process
- Patent number 6,086,454
- Issue date Jul 11, 2000
- Fujitsu Limited
- Yoshio Watanabe
- B24 - GRINDING POLISHING
Information Patent Grant
Reflection type photomask and reflection type photolithography meth...
- Patent number 5,338,647
- Issue date Aug 16, 1994
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,276,334
- Issue date Jan 4, 1994
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure system and charged particle beam exp...
- Patent number 5,260,579
- Issue date Nov 9, 1993
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflection type photomask with phase shifter
- Patent number 5,190,836
- Issue date Mar 2, 1993
- Fujitsu Limited
- Kenji Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure system
- Patent number 4,853,870
- Issue date Aug 1, 1989
- Fujitsu Limited
- Nobuyuki Yasutake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Wafer having chips for determining the position of the wafer by mea...
- Patent number 4,564,764
- Issue date Jan 14, 1986
- Fujitsu Limited
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing negative photoresist
- Patent number 4,508,968
- Issue date Apr 2, 1985
- Fujitsu Limited
- Koichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for processing negative photoresist
- Patent number 4,426,439
- Issue date Jan 17, 1984
- Fujitsu Limited
- Koichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of electron beam exposure
- Patent number 4,322,626
- Issue date Mar 30, 1982
- Fujitsu Limited
- Kenichi Kawashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure system and an apparatus for carrying out the...
- Patent number 4,291,231
- Issue date Sep 22, 1981
- Fujitsu Limited
- Kenichi Kawashima
- B82 - NANO-TECHNOLOGY

Kenichi Kawashima

Person

Patents Grantslast 30 patents

Method of fabricating a semiconductor device using a CMP process

Reflection type photomask and reflection type photolithography meth...

Charged particle beam exposure method and apparatus

Charged particle beam exposure system and charged particle beam exp...

Reflection type photomask with phase shifter

Electron beam exposure system

Wafer having chips for determining the position of the wafer by mea...

Apparatus for processing negative photoresist

Method and apparatus for processing negative photoresist

Method of electron beam exposure

Electron beam exposure system and an apparatus for carrying out the...