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Kenichi Kuwabara

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma processing method and apparatus
    • Patent number 9,230,782
    • Issue date Jan 5, 2016
    • Hitachi High-Technologies Corporation
    • Eiji Ikegami
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Plasma processing method and apparatus
    • Patent number 8,900,401
    • Issue date Dec 2, 2014
    • Hitachi High-Technologies Corporation
    • Eiji Ikegami
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 8,580,689
    • Issue date Nov 12, 2013
    • Hitachi High-Technologies Corporation
    • Tomoyoshi Ichimaru
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry etching method
    • Patent number 8,143,175
    • Issue date Mar 27, 2012
    • Hitachi High-Technologies Corporation
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method and apparatus
    • Patent number 8,038,896
    • Issue date Oct 18, 2011
    • Hitachi High-Technologies Corporation
    • Eiji Ikegami
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Dry etching method
    • Patent number 7,989,330
    • Issue date Aug 2, 2011
    • Hitachi High-Technologies Corporation
    • Takeshi Shima
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Vacuum processing apparatus and vacuum processing method
    • Patent number 7,112,805
    • Issue date Sep 26, 2006
    • Hitachi High-Technologies Corporation
    • Yoshitaka Kai
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING METHOD AND APPARATUS
    • Publication number 20150020970
    • Publication date Jan 22, 2015
    • Hitachi High-Technologies Corporation
    • Eiji IKEGAMI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING METHOD
    • Publication number 20130015158
    • Publication date Jan 17, 2013
    • Tomoyoshi Ichimaru
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND APPARATUS
    • Publication number 20100288195
    • Publication date Nov 18, 2010
    • Eiji Ikegami
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    DRY ETCHING METHOD
    • Publication number 20100285669
    • Publication date Nov 11, 2010
    • Takeshi SHIMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING METHOD
    • Publication number 20090280651
    • Publication date Nov 12, 2009
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing method and apparatus
    • Publication number 20070281478
    • Publication date Dec 6, 2007
    • Eiji Ikegami
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    Dry etching method
    • Publication number 20070218696
    • Publication date Sep 20, 2007
    • Kenichi Kuwabara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching method
    • Publication number 20070207618
    • Publication date Sep 6, 2007
    • Satoshi Une
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Vacuum processing apparatus and vacuum processing method
    • Publication number 20070023683
    • Publication date Feb 1, 2007
    • Yoshitaka Kai
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry etching method
    • Publication number 20060016781
    • Publication date Jan 26, 2006
    • Kenichi Kuwabara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Vacuum processing apparatus and vacuum processing method
    • Publication number 20050218337
    • Publication date Oct 6, 2005
    • Yoshitaka Kai
    • H01 - BASIC ELECTRIC ELEMENTS