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Kenichi Kuwahara

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  • Hikari, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20250105020
    • Publication date Mar 27, 2025
    • Hitachi High-Tech Corporation
    • Masaya IMAI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING APPARATUS
    • Publication number 20250095963
    • Publication date Mar 20, 2025
    • Hitachi High-Tech Corporation
    • Haixiang HUANG
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SEMICONDUCTOR WAFER PROCESSING METHOD
    • Publication number 20250038033
    • Publication date Jan 30, 2025
    • Hitachi High-Tech Corporation
    • Nozomu YOSHIOKA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
    • Publication number 20250029818
    • Publication date Jan 23, 2025
    • Hitachi High-Tech Corporation
    • Andre AMEND
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20240321583
    • Publication date Sep 26, 2024
    • Hitachi High-Tech Corporation
    • Miyako MATSUI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
    • Publication number 20240047239
    • Publication date Feb 8, 2024
    • Hitachi High-Tech Corporation
    • Miyako Matsui
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA PROCESSING METHOD
    • Publication number 20230411167
    • Publication date Dec 21, 2023
    • Hitachi High-Tech Corporation
    • Mamoru Yakushiji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20220384148
    • Publication date Dec 1, 2022
    • Hitachi High-Tech Corporation
    • Mamoru Yakushiji
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY ETCHING APPARATUS AND DRY ETCHING METHOD
    • Publication number 20210335625
    • Publication date Oct 28, 2021
    • Hitachi High-Technologies Corporation
    • Naoyuki KOFUJI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD
    • Publication number 20200411327
    • Publication date Dec 31, 2020
    • Hitachi High-Tech Corporation
    • Masaaki TANIYAMA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20200335354
    • Publication date Oct 22, 2020
    • Hitachi High-Tech Corporation
    • Miyako Matsui
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20190237337
    • Publication date Aug 1, 2019
    • Hitachi High-Technologies Corporation
    • Miyako MATSUI
    • G01 - MEASURING TESTING
  • Information Patent Application

    ETCHING METHOD AND PLASMA PROCESSING APPARATUS
    • Publication number 20180269118
    • Publication date Sep 20, 2018
    • Hitachi High-Technologies Corporation
    • Miyako MATSUI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DRY-ETCHING METHOD
    • Publication number 20170162397
    • Publication date Jun 8, 2017
    • Hitachi High-Technologies Corporation
    • Kenichi KUWAHARA
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA ETCHING METHOD
    • Publication number 20120003838
    • Publication date Jan 5, 2012
    • Hitachi High-Technologies Corporation
    • Kazumasa Ookuma
    • H01 - BASIC ELECTRIC ELEMENTS