Kenichi Kuwahara

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device manufacturing method and plasma processing method
- Patent number 12,142,489
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,887,814
- Issue date Jan 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,658,040
- Issue date May 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Masaaki Taniyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,462,416
- Issue date Oct 4, 2022
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,971,369
- Issue date Apr 6, 2021
- HITACHI HIGH-TECH CORPORATION
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,665,516
- Issue date May 26, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 10,622,269
- Issue date Apr 14, 2020
- Hitachi High-Technologies Corporation
- Miyako Matsui
- G01 - MEASURING TESTING
Information Patent Grant
Dry-etching method
- Patent number 10,192,749
- Issue date Jan 29, 2019
- Hitachi High-Technologies Corporation
- Kenichi Kuwahara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR WAFER PROCESSING METHOD
- Publication number 20250038033
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Nozomu YOSHIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE
- Publication number 20250029818
- Publication date Jan 23, 2025
- Hitachi High-Tech Corporation
- Andre AMEND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240321583
- Publication date Sep 26, 2024
- Hitachi High-Tech Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
- Publication number 20240047239
- Publication date Feb 8, 2024
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA PROCESSING METHOD
- Publication number 20230411167
- Publication date Dec 21, 2023
- Hitachi High-Tech Corporation
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20220384148
- Publication date Dec 1, 2022
- Hitachi High-Tech Corporation
- Mamoru Yakushiji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING APPARATUS AND DRY ETCHING METHOD
- Publication number 20210335625
- Publication date Oct 28, 2021
- Hitachi High-Technologies Corporation
- Naoyuki KOFUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20200411327
- Publication date Dec 31, 2020
- Hitachi High-Tech Corporation
- Masaaki TANIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200335354
- Publication date Oct 22, 2020
- Hitachi High-Tech Corporation
- Miyako Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190237337
- Publication date Aug 1, 2019
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- G01 - MEASURING TESTING
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180269118
- Publication date Sep 20, 2018
- Hitachi High-Technologies Corporation
- Miyako MATSUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY-ETCHING METHOD
- Publication number 20170162397
- Publication date Jun 8, 2017
- Hitachi High-Technologies Corporation
- Kenichi KUWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20120003838
- Publication date Jan 5, 2012
- Hitachi High-Technologies Corporation
- Kazumasa Ookuma
- H01 - BASIC ELECTRIC ELEMENTS

Kenichi Kuwahara

Person

Patents Grantslast 30 patents

Semiconductor device manufacturing method and plasma processing method

Plasma processing method

Plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Etching method and plasma processing apparatus

Etching method and plasma processing apparatus

Dry-etching method

Patents Applicationslast 30 patents

SEMICONDUCTOR WAFER PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

PLASMA PROCESSING METHOD

PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD

DRY ETCHING APPARATUS AND DRY ETCHING METHOD

PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

DRY-ETCHING METHOD

PLASMA ETCHING METHOD