Kenichi Nagata

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target and/or coil, and process for producing same
- Patent number 10,557,195
- Issue date Feb 11, 2020
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper alloy sputtering target
- Patent number 10,276,356
- Issue date Apr 30, 2019
- JX Nippon Mining & Metals Corporation
- Tomio Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and/or coil, and process for producing same
- Patent number 9,951,412
- Issue date Apr 24, 2018
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C21 - METALLURGY OF IRON
Information Patent Grant
High-purity copper-cobalt alloy sputtering target
- Patent number 9,909,196
- Issue date Mar 6, 2018
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target and manufacturing method therefor
- Patent number 9,704,695
- Issue date Jul 11, 2017
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- B21 - MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL PUNCHING...
Information Patent Grant
High purity copper—manganese alloy sputtering target
- Patent number 9,165,750
- Issue date Oct 20, 2015
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
High-purity copper-manganese-alloy sputtering target
- Patent number 9,090,970
- Issue date Jul 28, 2015
- JX Nippon Mining & Metals Corporation
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME
- Publication number 20180010241
- Publication date Jan 11, 2018
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C21 - METALLURGY OF IRON
Information Patent Application
HIGH-PURITY COPPER-COBALT ALLOY SPUTTERING TARGET
- Publication number 20150354047
- Publication date Dec 10, 2015
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
COPPER ALLOY SPUTTERING TARGET
- Publication number 20150279638
- Publication date Oct 1, 2015
- JX NIPPON MINING & METALS CORPORATION
- Tomio Otsuki
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR
- Publication number 20140318953
- Publication date Oct 30, 2014
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High Purity Copper-Manganese Alloy Sputtering Target
- Publication number 20140284211
- Publication date Sep 25, 2014
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
HIGH-PURITY COPPER-MANGANESE-ALLOY SPUTTERING TARGET
- Publication number 20140158532
- Publication date Jun 12, 2014
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
High-Purity Copper-Manganese-Alloy Sputtering Target
- Publication number 20140097084
- Publication date Apr 10, 2014
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME
- Publication number 20130112556
- Publication date May 9, 2013
- JX NIPPON MINING & METALS CORPORATION
- Kenichi Nagata
- C21 - METALLURGY OF IRON

Kenichi Nagata

Person

Patents Grantslast 30 patents

Sputtering target and/or coil, and process for producing same

Copper alloy sputtering target

Sputtering target and/or coil, and process for producing same

High-purity copper-cobalt alloy sputtering target

Sputtering target and manufacturing method therefor

High purity copper—manganese alloy sputtering target

High-purity copper-manganese-alloy sputtering target

Patents Applicationslast 30 patents

SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME

HIGH-PURITY COPPER-COBALT ALLOY SPUTTERING TARGET

COPPER ALLOY SPUTTERING TARGET

SPUTTERING TARGET AND MANUFACTURING METHOD THEREFOR

High Purity Copper-Manganese Alloy Sputtering Target

HIGH-PURITY COPPER-MANGANESE-ALLOY SPUTTERING TARGET

High-Purity Copper-Manganese-Alloy Sputtering Target

SPUTTERING TARGET AND/OR COIL, AND PROCESS FOR PRODUCING SAME