Kenji Funatsu

Person

Joetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,816,900
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition, and pattern forming process
- Patent number 10,457,761
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,203,601
- Issue date Feb 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polymer
- Patent number 10,191,373
- Issue date Jan 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 9,778,568
- Issue date Oct 3, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming process and shrink agent
- Patent number 9,618,850
- Issue date Apr 11, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,551,932
- Issue date Jan 24, 2017
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 9,250,523
- Issue date Feb 2, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process and resist composition
- Patent number 9,122,152
- Issue date Sep 1, 2015
- Shin-Etsu Chemicals Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative pattern forming process
- Patent number 9,091,933
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 9,086,625
- Issue date Jul 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, patterning process and polymer
- Patent number 9,040,223
- Issue date May 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,871,427
- Issue date Oct 28, 2014
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming process
- Patent number 8,623,590
- Issue date Jan 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers, resist compositions and patterning process
- Patent number 7,718,342
- Issue date May 18, 2010
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist material and patterning processing
- Patent number 7,157,207
- Issue date Jan 2, 2007
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist polymer, resist composition and patterning process
- Patent number 7,135,270
- Issue date Nov 14, 2006
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition and patterning process
- Patent number 6,835,525
- Issue date Dec 28, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tsunehiro Nishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silylation of hydroxyl group-containing compound
- Patent number 6,239,303
- Issue date May 29, 2001
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20240427241
- Publication date Dec 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240118613
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240094635
- Publication date Mar 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
- Publication number 20230367213
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230367214
- Publication date Nov 16, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230341775
- Publication date Oct 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20230194986
- Publication date Jun 22, 2023
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FO...
- Publication number 20220404701
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi MASUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20220308451
- Publication date Sep 29, 2022
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20220260909
- Publication date Aug 18, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20190018320
- Publication date Jan 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20180120702
- Publication date May 3, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20170226250
- Publication date Aug 10, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING POLYMER
- Publication number 20170097567
- Publication date Apr 6, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSTITIVE RESIST COMPOSTION AND PATTERNING PROCESS
- Publication number 20160327864
- Publication date Nov 10, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160229940
- Publication date Aug 11, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20160168296
- Publication date Jun 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING PROCESS AND SHRINK AGENT
- Publication number 20160124313
- Publication date May 5, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150268555
- Publication date Sep 24, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kenji FUNATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140212808
- Publication date Jul 31, 2014
- Shin-Etsu Chemical Co., Ltd.
- Kenji Funatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER
- Publication number 20140178820
- Publication date Jun 26, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140065544
- Publication date Mar 6, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20140065545
- Publication date Mar 6, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20140011136
- Publication date Jan 9, 2014
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PATTERN FORMING PROCESS
- Publication number 20130130183
- Publication date May 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130101936
- Publication date Apr 25, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke Taniguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20130045444
- Publication date Feb 21, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryosuke TANIGUCHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20120135357
- Publication date May 31, 2012
- Tomohiro KOBAYASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING PROCESS
- Publication number 20120108043
- Publication date May 3, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING...
- Publication number 20110054133
- Publication date Mar 3, 2011
- Shin-Etsu Chemical Co., Ltd.
- Seiichiro Tachibana
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kenji Funatsu

Person

Patents Grantslast 30 patents

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Polymer, resist composition, and pattern forming process

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Method for producing polymer

Positive resist composition and patterning process

Pattern forming process and shrink agent

Patterning process and resist composition

Resist composition and patterning process

Patterning process and resist composition

Negative pattern forming process

Resist composition and patterning process

Resist composition, patterning process and polymer

Positive resist composition and patterning process

Pattern forming process

Polymers, resist compositions and patterning process

Polymer, resist material and patterning processing

Resist polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Silylation of hydroxyl group-containing compound

Patents Applicationslast 30 patents

MONOMER, POLYMER, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

CHEMICALLY AMPLIFIED RESIST COMPOSITION, PHOTOMASK BLANK, METHOD FO...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

METHOD FOR PRODUCING POLYMER

POSTITIVE RESIST COMPOSTION AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

PATTERN FORMING PROCESS AND SHRINK AGENT

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

NEGATIVE PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERN FORMING PROCESS

RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING...