Kenji Iwade

Person

Hiratsuka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 10,121,677
- Issue date Nov 6, 2018
- TOSHIBA MEMORY CORPORATION
- Yukiteru Matsui
- B24 - GRINDING POLISHING
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,558,961
- Issue date Jan 31, 2017
- Kabushiki Kaisha Toshiba
- Akifumi Gawase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,748,289
- Issue date Jun 10, 2014
- Ebara Corporation
- Masayuki Nakanishi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 8,641,480
- Issue date Feb 4, 2014
- Ebara Corporation
- Masayuki Nakanishi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing aqueous dispersion and chemical mecha...
- Patent number 8,492,276
- Issue date Jul 23, 2013
- JSR Corporation
- Taichi Abe
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,445,360
- Issue date May 21, 2013
- Ebara Corporation
- Masayuki Nakanishi
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 8,292,694
- Issue date Oct 23, 2012
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 7,883,394
- Issue date Feb 8, 2011
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding mechanism, substrate polishing apparatus and subs...
- Patent number 7,419,420
- Issue date Sep 2, 2008
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
TEMPLATE CLEANING METHOD, TEMPLATE CLEANING APPARATUS, AND CLEANING...
- Publication number 20180264524
- Publication date Sep 20, 2018
- Toshiba Memory Corporation
- Yumi TANAKA
- B08 - CLEANING
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICA...
- Publication number 20170133238
- Publication date May 11, 2017
- Kabushiki Kaisha Toshiba
- Takahiko KAWASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160358787
- Publication date Dec 8, 2016
- Kabushiki Kaisha Toshiba
- Akifumi Gawase
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160322231
- Publication date Nov 3, 2016
- Kabushiki Kaisha Toshiba
- Yukiteru Matsui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RETAINER RING, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEM...
- Publication number 20160229026
- Publication date Aug 11, 2016
- Kabushiki Kaisha Toshiba
- Takahiko KAWASAKI
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130237033
- Publication date Sep 12, 2013
- EBARA CORPORATION
- Masayuki NAKANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING METHOD
- Publication number 20110256811
- Publication date Oct 20, 2011
- Masayuki NAKANISHI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20110217906
- Publication date Sep 8, 2011
- Masayuki NAKANISHI
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110207294
- Publication date Aug 25, 2011
- Masayuki NAKANISHI
- B24 - GRINDING POLISHING
Information Patent Application
CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHA...
- Publication number 20100075501
- Publication date Mar 25, 2010
- JSR Corporation
- Taichi ABE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...
- Publication number 20100062691
- Publication date Mar 11, 2010
- Tetsuji TOGAWA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...
- Publication number 20080318503
- Publication date Dec 25, 2008
- Tetsuji TOGAWA
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding mechanism, substrate polishing apparatus and subs...
- Publication number 20060205323
- Publication date Sep 14, 2006
- Tetsuji Togawa
- B24 - GRINDING POLISHING

Kenji Iwade

Person

Patents Grantslast 30 patents

Manufacturing method of semiconductor device

Manufacturing method of semiconductor device

Method for manufacturing semiconductor device

Polishing apparatus and polishing method

Chemical mechanical polishing aqueous dispersion and chemical mecha...

Method for manufacturing semiconductor device

Substrate holding mechanism, substrate polishing apparatus and subs...

Substrate holding mechanism, substrate polishing apparatus and subs...

Substrate holding mechanism, substrate polishing apparatus and subs...

Patents Applicationslast 30 patents

TEMPLATE CLEANING METHOD, TEMPLATE CLEANING APPARATUS, AND CLEANING...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SLURRY FOR CHEMICA...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

RETAINER RING, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEM...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

POLISHING METHOD

POLISHING APPARATUS AND POLISHING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHA...

SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...

SUBSTRATE HOLDING MECHANISM, SUBSTRATE POLISHING APPARATUS AND SUBS...

Substrate holding mechanism, substrate polishing apparatus and subs...