Kenji OKAMURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Low expansion glass substrate for reflection type mask and method f...
- Patent number 8,524,422
- Issue date Sep 3, 2013
- Asahi Glass Company, Limited
- Kenji Okamura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for finishing surface of preliminary polished glass substrate
- Patent number 8,460,843
- Issue date Jun 11, 2013
- Asahi Glass Company, Limited
- Koji Otsuka
- G01 - MEASURING TESTING
Information Patent Grant
Method for finishing surface of preliminary polished glass substrate
- Patent number 7,998,645
- Issue date Aug 16, 2011
- Asahi Glass Company, Limited
- Koji Otsuka
- G01 - MEASURING TESTING
Information Patent Grant
Method for finishing surface of preliminary polished glass substrate
- Patent number 7,803,280
- Issue date Sep 28, 2010
- Asahi Glass Company, Limited
- Koji Otsuka
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming photoresist pattern
- Patent number 6,348,418
- Issue date Feb 19, 2002
- NEC Corporation
- Kenji Okamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 6,187,623
- Issue date Feb 13, 2001
- NEC Corporation
- Toshiyuki Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device and semiconductor dev...
- Patent number 6,143,619
- Issue date Nov 7, 2000
- NEC Corporation
- Kenji Okamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process of fabricating dynamic random access memory cell having int...
- Patent number 5,691,229
- Issue date Nov 25, 1997
- NEC Corporation
- Kenji Okamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor devices
- Patent number 5,521,126
- Issue date May 28, 1996
- NEC Corporation
- Kenji Okamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having polycrystalline silicon resistor
- Patent number 4,961,103
- Issue date Oct 2, 1990
- NEC Corporation
- Manzoh Saitoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VEHICLE, CONTROL DEVICE AND CONTROL METHOD THEREFOR, AND STORAGE ME...
- Publication number 20240411844
- Publication date Dec 12, 2024
- Honda Motor Co., Ltd.
- Kenji OKAMURA
- B60 - VEHICLES IN GENERAL
Information Patent Application
METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE
- Publication number 20110281069
- Publication date Nov 17, 2011
- Asahi Glass Company, Limited
- Koji OTSUKA
- G01 - MEASURING TESTING
Information Patent Application
LOW EXPANSION GLASS SUBSTRATE FOR REFLECTION TYPE MASK AND METHOD F...
- Publication number 20110244171
- Publication date Oct 6, 2011
- ASAHI GLASS COMPANY LIMITED
- Kenji OKAMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
TIO2-CONTAINING QUARTZ GLASS SUBSTRATE
- Publication number 20110089612
- Publication date Apr 21, 2011
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE
- Publication number 20100304282
- Publication date Dec 2, 2010
- Asahi Glass Company, Limited
- Koji OTSUKA
- G01 - MEASURING TESTING
Information Patent Application
TiO2-containing quartz glass substrate
- Publication number 20100234205
- Publication date Sep 16, 2010
- Asahi Glass Company, Limited
- Yoshiaki Ikuta
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND...
- Publication number 20100101940
- Publication date Apr 29, 2010
- ASAHI GLASS COMPANY, LIMITED
- Masabumi Ito
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF PROCESSING GLASS SUBSTRATE SURFACE
- Publication number 20100080961
- Publication date Apr 1, 2010
- ASAHI GLASS COMPANY, LIMITED
- Kenji OKAMURA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE
- Publication number 20090233192
- Publication date Sep 17, 2009
- ASAHI GLASS COMPANY LIMITED
- Koji Otsuka
- G01 - MEASURING TESTING

Kenji OKAMURA

Person

Patents Grantslast 30 patents

Low expansion glass substrate for reflection type mask and method f...

Method for finishing surface of preliminary polished glass substrate

Method for finishing surface of preliminary polished glass substrate

Method for finishing surface of preliminary polished glass substrate

Method of forming photoresist pattern

Method of manufacturing semiconductor device

Method for manufacturing semiconductor device and semiconductor dev...

Process of fabricating dynamic random access memory cell having int...

Method of fabricating semiconductor devices

Semiconductor device having polycrystalline silicon resistor

Patents Applicationslast 30 patents

VEHICLE, CONTROL DEVICE AND CONTROL METHOD THEREFOR, AND STORAGE ME...

METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE

LOW EXPANSION GLASS SUBSTRATE FOR REFLECTION TYPE MASK AND METHOD F...

TIO2-CONTAINING QUARTZ GLASS SUBSTRATE

METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE

TiO2-containing quartz glass substrate

METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND...

METHOD OF PROCESSING GLASS SUBSTRATE SURFACE

METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE