Kenji Sugishima

Person

Inagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern inspection apparatus and electron beam apparatus
- Patent number 5,557,105
- Issue date Sep 17, 1996
- Fujitsu Limited
- Ichiro Honjo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
X-ray mask, method of manufacturing the x-ray mask and exposure met...
- Patent number 5,541,023
- Issue date Jul 30, 1996
- Fujitsu Limited
- Kazuaki Kondo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern inspection apparatus and electron beam apparatus
- Patent number 5,430,292
- Issue date Jul 4, 1995
- Fujitsu Limited
- Ichiro Honjo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern inspection apparatus and electron beam apparatus
- Patent number 5,384,463
- Issue date Jan 24, 1995
- Fujisu Limited
- Ichiro Honjo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle for photolithographic patterning
- Patent number 5,126,220
- Issue date Jun 30, 1992
- Fujitsu Limited
- Kazuo Tokitomo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray lithography system
- Patent number 4,748,646
- Issue date May 31, 1988
- Fujitsu Limited
- Toshihiko Osada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frictionless supporting apparatus
- Patent number 4,684,315
- Issue date Aug 4, 1987
- Fujitsu Limited
- Kenji Sugishima
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Electron beam exposure method and apparatus
- Patent number 4,678,919
- Issue date Jul 7, 1987
- Fujitsu Limited
- Kenji Sugishima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making Schottky barrier diode by selective beam-crystalli...
- Patent number 4,377,031
- Issue date Mar 22, 1983
- Fujitsu Limited
- Hiroshi Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 4,352,724
- Issue date Oct 5, 1982
- Fujitsu Limited
- Kenji Sugishima
- H01 - BASIC ELECTRIC ELEMENTS

Kenji Sugishima

Person

Patents Grantslast 30 patents

Pattern inspection apparatus and electron beam apparatus

X-ray mask, method of manufacturing the x-ray mask and exposure met...

Pattern inspection apparatus and electron beam apparatus

Pattern inspection apparatus and electron beam apparatus

Reticle for photolithographic patterning

X-ray lithography system

Frictionless supporting apparatus

Electron beam exposure method and apparatus

Method of making Schottky barrier diode by selective beam-crystalli...

Method of manufacturing a semiconductor device