Kenji TAKASE

Person

Funabashi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation sensitive composition
- Patent number 11,561,472
- Issue date Jan 24, 2023
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,175,583
- Issue date Nov 16, 2021
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Film-forming composition containing silicone having crosslinking re...
- Patent number 10,845,703
- Issue date Nov 24, 2020
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film-forming composition containing substituted c...
- Patent number 10,809,619
- Issue date Oct 20, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming resist underlayer film
- Patent number 10,684,546
- Issue date Jun 16, 2020
- NISSAN CHEMICAL CORPORATION
- Yasushi Sakaida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymerizable composition comprising reactive silsesquioxane compou...
- Patent number 10,450,418
- Issue date Oct 22, 2019
- Nissan Chemical Industries, Ltd.
- Takehiro Nagasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition for lithography containi...
- Patent number 10,372,040
- Issue date Aug 6, 2019
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing resists underlayer film-forming composition havi...
- Patent number 10,197,917
- Issue date Feb 5, 2019
- Nissan Chemical Industries, Ltd.
- Makoto Nakajima
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film forming composition containing silicon conta...
- Patent number 10,079,146
- Issue date Sep 18, 2018
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Additive and resist underlayer film-forming composition containing...
- Patent number 10,067,423
- Issue date Sep 4, 2018
- Nissan Chemical Industries, Ltd.
- Yuto Hashimoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing silane compound having sulfonyl bond
- Patent number 9,765,097
- Issue date Sep 19, 2017
- Nissan Chemical Industries, Ltd.
- Kenji Takase
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist underlayer film forming composition containing silicon havin...
- Patent number 9,494,862
- Issue date Nov 15, 2016
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film h...
- Patent number 9,290,623
- Issue date Mar 22, 2016
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for stabilizing silanol-group-containing polysiloxane soluti...
- Patent number 9,127,161
- Issue date Sep 8, 2015
- Nissan Chemical Industries, Ltd.
- Kenji Takase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20230125270
- Publication date Apr 27, 2023
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN-FORMING COMPOSITION
- Publication number 20230045061
- Publication date Feb 9, 2023
- NISSAN CHEMICAL CORPORATION
- Naoki NAKAIE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...
- Publication number 20200379352
- Publication date Dec 3, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20200026191
- Publication date Jan 23, 2020
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERIZABLE COMPOSITION COMPRISING REACTIVE SILSESQUIOXANE COMPOU...
- Publication number 20190292324
- Publication date Sep 26, 2019
- Nissan Chemical Industries, Ltd.
- Takehiro NAGASAWA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM
- Publication number 20190163063
- Publication date May 30, 2019
- NISSAN CHEMICAL CORPORATION
- Yasushi SAKAIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING RE...
- Publication number 20180335698
- Publication date Nov 22, 2018
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION SENSITIVE COMPOSITION
- Publication number 20180181000
- Publication date Jun 28, 2018
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...
- Publication number 20170322491
- Publication date Nov 9, 2017
- Nissan Chemical Industries, Ltd.
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20170168397
- Publication date Jun 15, 2017
- Nissan Chemical Industries, Ltd.
- Wataru SHIBAYAMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PRODUCING SILANE COMPOUND HAVING SULFONYL BOND
- Publication number 20170158716
- Publication date Jun 8, 2017
- Nissan Chemical Industries, Ltd.
- Kenji TAKASE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20170146906
- Publication date May 25, 2017
- Nissan Chemical Industries, Ltd.
- Makoto NAKAJIMA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING...
- Publication number 20170108777
- Publication date Apr 20, 2017
- Nissan Chemical Industries, Ltd.
- Yuto HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...
- Publication number 20160139509
- Publication date May 19, 2016
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...
- Publication number 20150322212
- Publication date Nov 12, 2015
- Nissan Chemical Industries, Ltd.
- Yuta KANNO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON CONTA...
- Publication number 20150249012
- Publication date Sep 3, 2015
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...
- Publication number 20150159045
- Publication date Jun 11, 2015
- Nissan Chemical Industries, Ltd.
- Yuta Kanno
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR STABILIZING SILANOL-GROUP-CONTAINING POLYSILOXANE SOLUTI...
- Publication number 20140309317
- Publication date Oct 16, 2014
- Kenji Takase
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kenji TAKASE

Person

Patents Grantslast 30 patents

Radiation sensitive composition

Silicon-containing resist underlayer film-forming composition havin...

Silicon-containing resist underlayer film-forming composition havin...

Film-forming composition containing silicone having crosslinking re...

Resist underlayer film-forming composition containing substituted c...

Composition for forming resist underlayer film

Polymerizable composition comprising reactive silsesquioxane compou...

Resist underlayer film forming composition for lithography containi...

Silicon-containing resists underlayer film-forming composition havi...

Resist underlayer film forming composition containing silicon conta...

Additive and resist underlayer film-forming composition containing...

Method for producing silane compound having sulfonyl bond

Resist underlayer film forming composition containing silicon havin...

Composition for forming silicon-containing resist underlayer film h...

Method for stabilizing silanol-group-containing polysiloxane soluti...

Patents Applicationslast 30 patents

RADIATION SENSITIVE COMPOSITION

PATTERN-FORMING COMPOSITION

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

POLYMERIZABLE COMPOSITION COMPRISING REACTIVE SILSESQUIOXANE COMPOU...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM

FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING RE...

RADIATION SENSITIVE COMPOSITION

RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINI...

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

METHOD FOR PRODUCING SILANE COMPOUND HAVING SULFONYL BOND

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM H...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON CONTA...

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVIN...

METHOD FOR STABILIZING SILANOL-GROUP-CONTAINING POLYSILOXANE SOLUTI...