Kenji Wada

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing polymer and flow-type reaction system for...
- Patent number 12,024,573
- Issue date Jul 2, 2024
- FUJIFILM Corporation
- Kenji Wada
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for producing group III-V semiconductor nanoparticle, method...
- Patent number 11,492,252
- Issue date Nov 8, 2022
- FUJIFILM Corporation
- Hideki Matsumoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for manufacturing polymer and flow-type reaction system for...
- Patent number 11,332,551
- Issue date May 17, 2022
- FUJIFILM Corporation
- Kenji Wada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacturing polymer and flow-type reaction system for...
- Patent number 11,242,414
- Issue date Feb 8, 2022
- FUJIFILM Corporation
- Kenji Wada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing semiconductor quantum dot and semiconductor...
- Patent number 10,947,112
- Issue date Mar 16, 2021
- FUJIFILM Corporation
- Kenji Wada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...
- Patent number 10,570,112
- Issue date Feb 25, 2020
- FUJIFILM Corporation
- Kouki Nakamura
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...
- Patent number 10,093,645
- Issue date Oct 9, 2018
- FUJIFILM Corporation
- Kouki Nakamura
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...
- Patent number 9,475,835
- Issue date Oct 25, 2016
- FUJIFILM Corporation
- Kouki Nakamura
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...
- Patent number 9,221,865
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Kouki Nakamura
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...
- Patent number 9,187,514
- Issue date Nov 17, 2015
- FUJIFILM Corporation
- Kouki Nakamura
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Photosensitive composition, pattern forming method using the photos...
- Patent number 9,051,403
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 8,877,969
- Issue date Nov 4, 2014
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, pattern forming material, and photosens...
- Patent number 8,753,801
- Issue date Jun 17, 2014
- FUJIFILM Corporation
- Toshiyuki Saie
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,603,733
- Issue date Dec 10, 2013
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermo- and/or photo-sensitive material and insulator film made the...
- Patent number 8,530,583
- Issue date Sep 10, 2013
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition, pattern forming method using the compo...
- Patent number 8,507,174
- Issue date Aug 13, 2013
- FUJIFILM Corporation
- Hidenori Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and pattern forming method using the po...
- Patent number 8,507,172
- Issue date Aug 13, 2013
- FUJIFILM Corporation
- Kenji Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for optical materials
- Patent number 8,506,853
- Issue date Aug 13, 2013
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive composition, pattern-forming method using the photos...
- Patent number 8,426,101
- Issue date Apr 23, 2013
- FUJIFILM Corporation
- Kenji Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, and pattern-forming method and resist f...
- Patent number 8,404,427
- Issue date Mar 26, 2013
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, resist composition to be used in the patter...
- Patent number 8,241,840
- Issue date Aug 14, 2012
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 8,158,326
- Issue date Apr 17, 2012
- FUJIFILM Corporation
- Kunihiko Kodama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition containing novel sulfonium compound, pattern-for...
- Patent number 8,110,333
- Issue date Feb 7, 2012
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and pattern forming method using the same
- Patent number 8,092,976
- Issue date Jan 10, 2012
- FUJIFILM Corporation
- Sou Kamimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and pattern forming method
- Patent number 8,088,550
- Issue date Jan 3, 2012
- FUJIFILM Corporation
- Shinji Tarutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition, resin for use in the resist composition, compou...
- Patent number 8,053,161
- Issue date Nov 8, 2011
- FUJIFILM Corporation
- Kenji Wada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, resist composition to be used in the patter...
- Patent number 8,034,547
- Issue date Oct 11, 2011
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, and resist composition, developer and rinsi...
- Patent number 8,017,304
- Issue date Sep 13, 2011
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition, compound for use in the photosensitive...
- Patent number 7,923,199
- Issue date Apr 12, 2011
- FUJIFILM Corporation
- Kenji Wada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of pattern formation with the same
- Patent number 7,914,965
- Issue date Mar 29, 2011
- FUJIFILM Corporation
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING HALOGENOBICYCLO[1.1.1]PENTANE
- Publication number 20240279143
- Publication date Aug 22, 2024
- FUJIFILM CORPORATION
- Kazuhiro TSUNA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PRODUCTION METHOD OF INCLUSION BODY OF BICYCLOALKANE COMPOUND
- Publication number 20240252676
- Publication date Aug 1, 2024
- FUJIFILM CORPORATION
- Kazuhiro TSUNA
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
METHOD FOR PRODUCING 1,3-DISUBSTITUTED BICYCLO[1.1.1]PENTANE BY PHO...
- Publication number 20240190800
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Kazuhiro TSUNA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING N-(HETERO)ARYL (METH)ACRYLAMIDE COMPOUND
- Publication number 20240051916
- Publication date Feb 15, 2024
- FUJIFILM CORPORATION
- Yasutaka TASAKI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSF...
- Publication number 20230391896
- Publication date Dec 7, 2023
- FUJIFILM CORPORATION
- Kenji WADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING THIOCARBONYLTHIO GROUP-REMOVED POLYMER
- Publication number 20230391898
- Publication date Dec 7, 2023
- FUJIFILM CORPORATION
- Kenji WADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING CARBONYL COMPOUND AND FLOW TYPE REACTION SYSTEM...
- Publication number 20220144760
- Publication date May 12, 2022
- FUJIFILM CORPORATION
- Ryo NISHIO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PRODUCING CARBONYL COMPOUND AND FLOW TYPE REACTION SYSTEM...
- Publication number 20220135517
- Publication date May 5, 2022
- FUJIFILM CORPORATION
- Ryo NISHIO
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...
- Publication number 20210206886
- Publication date Jul 8, 2021
- FUJIFILM CORPORATION
- Kenji WADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...
- Publication number 20200369793
- Publication date Nov 26, 2020
- FUJIFILM CORPORATION
- Kenji WADA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...
- Publication number 20200223949
- Publication date Jul 16, 2020
- FUJIFILM CORPORATION
- Kenji WADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING GROUP III-V SEMICONDUCTOR NANOPARTICLE, METHOD...
- Publication number 20200017358
- Publication date Jan 16, 2020
- FUJIFILM CORPORATION
- Hideki MATSUMOTO
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR QUANTUM DOT AND SEMICONDUCTOR...
- Publication number 20190027562
- Publication date Jan 24, 2019
- FUJIFILM CORPORATION
- Kenji WADA
- B82 - NANO-TECHNOLOGY
Information Patent Application
GAS SEPARATION MEMBRANE, GAS SEPARATION MODULE, GAS SEPARATOR, GAS...
- Publication number 20180361327
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Keisuke KODAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...
- Publication number 20180327377
- Publication date Nov 15, 2018
- FUJIFILM CORPORATION
- Kouki NAKAMURA
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...
- Publication number 20160362389
- Publication date Dec 15, 2016
- FUJIFILM CORPORATION
- Kouki NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...
- Publication number 20160024132
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- Kouki NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...
- Publication number 20150152131
- Publication date Jun 4, 2015
- FUJIFILM CORPORATION
- Kouki NAKAMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE...
- Publication number 20130133537
- Publication date May 30, 2013
- FUJIFILM CORPORATION
- Kenji WADA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATE, FLEXOGRAPHIC PRI...
- Publication number 20130133538
- Publication date May 30, 2013
- FUJIFILM CORPORATION
- Kenta USHIJIMA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120207978
- Publication date Aug 16, 2012
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSI...
- Publication number 20120003437
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Kenji WADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENS...
- Publication number 20120003436
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Toshiyuki SAIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...
- Publication number 20110305992
- Publication date Dec 15, 2011
- FUJIFILM CORPORATION
- Shinji TARUTANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION
- Publication number 20110245416
- Publication date Oct 6, 2011
- FUJIFILM Corporation
- Kenji Wada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPO...
- Publication number 20110183258
- Publication date Jul 28, 2011
- FUJIFILM CORPORATION
- Hidenori Takahashi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR OPTICAL MATERIALS
- Publication number 20110089385
- Publication date Apr 21, 2011
- FUJIFILM CORPORATION
- Kenji Wada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...
- Publication number 20100330507
- Publication date Dec 30, 2010
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST F...
- Publication number 20100239978
- Publication date Sep 23, 2010
- FUJIFILM Corporation
- Kenji Wada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOS...
- Publication number 20100233617
- Publication date Sep 16, 2010
- FUJIFILM CORPORATION
- Kenji Wada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Method for manufacturing polymer and flow-type reaction system for...

Method for producing group III-V semiconductor nanoparticle, method...

Method for manufacturing polymer and flow-type reaction system for...

Method for manufacturing polymer and flow-type reaction system for...

Method of manufacturing semiconductor quantum dot and semiconductor...

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofur...

Photosensitive composition, pattern forming method using the photos...

Photosensitive composition, compound for use in the photosensitive...

Photosensitive composition, pattern forming material, and photosens...

Pattern forming method, and resist composition, developer and rinsi...

Thermo- and/or photo-sensitive material and insulator film made the...

Positive resist composition, pattern forming method using the compo...

Positive resist composition and pattern forming method using the po...

Composition for optical materials

Photosensitive composition, pattern-forming method using the photos...

Photosensitive composition, and pattern-forming method and resist f...

Pattern forming method, resist composition to be used in the patter...

Photosensitive composition, compound for use in the photosensitive...

Resist composition containing novel sulfonium compound, pattern-for...

Resist composition and pattern forming method using the same

Positive resist composition and pattern forming method

Resist composition, resin for use in the resist composition, compou...

Pattern forming method, resist composition to be used in the patter...

Pattern forming method, and resist composition, developer and rinsi...

Photosensitive composition, compound for use in the photosensitive...

Resist composition and method of pattern formation with the same

Patents Applicationslast 30 patents

METHOD FOR PRODUCING HALOGENOBICYCLO[1.1.1]PENTANE

PRODUCTION METHOD OF INCLUSION BODY OF BICYCLOALKANE COMPOUND

METHOD FOR PRODUCING 1,3-DISUBSTITUTED BICYCLO[1.1.1]PENTANE BY PHO...

METHOD FOR PRODUCING N-(HETERO)ARYL (METH)ACRYLAMIDE COMPOUND

METHOD FOR PRODUCING REVERSIBLE ADDITION-FRAGMENTATION CHAIN TRANSF...

METHOD FOR PRODUCING THIOCARBONYLTHIO GROUP-REMOVED POLYMER

METHOD OF PRODUCING CARBONYL COMPOUND AND FLOW TYPE REACTION SYSTEM...

METHOD OF PRODUCING CARBONYL COMPOUND AND FLOW TYPE REACTION SYSTEM...

METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...

METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...

METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR...

METHOD FOR PRODUCING GROUP III-V SEMICONDUCTOR NANOPARTICLE, METHOD...

METHOD OF MANUFACTURING SEMICONDUCTOR QUANTUM DOT AND SEMICONDUCTOR...

GAS SEPARATION MEMBRANE, GAS SEPARATION MODULE, GAS SEPARATOR, GAS...

SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...

SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...

SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...

SYNTHETIC INTERMEDIATE OF 1-(2-DEOXY-2-FLUORO-4-THIO-ß-D-ARABINOFUR...

RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE...

RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATE, FLEXOGRAPHIC PRI...

ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL AND PHOTOSENSI...

PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, AND PHOTOSENS...

PATTERN FORMING METHOD, AND RESIST COMPOSITION, DEVELOPER AND RINSI...

COMPOSITION

POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPO...

COMPOSITION FOR OPTICAL MATERIALS

PATTERN FORMING METHOD, RESIST COMPOSITION TO BE USED IN THE PATTER...

PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST F...

PHOTOSENSITIVE COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOS...