Kenji Yamada

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 11,609,497
- Issue date Mar 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Sasami
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Iodonium salt, resist composition, and pattern forming process
- Patent number 11,448,961
- Issue date Sep 20, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified negative resist composition and resist pattern...
- Patent number 10,725,377
- Issue date Jul 28, 2020
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, pattern forming process, polymer, and monomer
- Patent number 10,310,376
- Issue date Jun 4, 2019
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative resist composition and resist pattern forming process
- Patent number 10,120,279
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 9,921,479
- Issue date Mar 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kenji Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shrink material and pattern forming process
- Patent number 9,904,172
- Issue date Feb 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Kentaro Kumaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240103364
- Publication date Mar 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230305398
- Publication date Sep 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takeshi SASAMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20230161254
- Publication date May 25, 2023
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200218154
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takeshi SASAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
- Publication number 20200081341
- Publication date Mar 12, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20180180998
- Publication date Jun 28, 2018
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
- Publication number 20180039175
- Publication date Feb 8, 2018
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER
- Publication number 20170184967
- Publication date Jun 29, 2017
- Shin-Etsu Chemical Co., Ltd.
- Teppei Adachi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20160320699
- Publication date Nov 3, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kenji Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHRINK MATERIAL AND PATTERN FORMING PROCESS
- Publication number 20160161850
- Publication date Jun 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Kentaro Kumaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kenji Yamada

Person

Patents Grantslast 30 patents

Resist composition and patterning process

Iodonium salt, resist composition, and pattern forming process

Chemically amplified negative resist composition and resist pattern...

Resist composition, pattern forming process, polymer, and monomer

Negative resist composition and resist pattern forming process

Resist composition and patterning process

Shrink material and pattern forming process

Patents Applicationslast 30 patents

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

RESIST COMPOSITION AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

IODONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...

NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER

RESIST COMPOSITION AND PATTERNING PROCESS

SHRINK MATERIAL AND PATTERN FORMING PROCESS