Kenji Yokomizo

Person

Scottsdale, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 8,303,723
- Issue date Nov 6, 2012
- Tokyo Electron Limited
- Teruomi Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method
- Patent number 7,678,199
- Issue date Mar 16, 2010
- Tokyo Electron Limited
- Shogo Mizota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of securing a workpiece during high-pressure p...
- Patent number 7,270,137
- Issue date Sep 18, 2007
- Tokyo Electron Limited
- Kenji Yokomizo
- B08 - CLEANING
Information Patent Grant
Etching method and etching apparatus
- Patent number 6,780,277
- Issue date Aug 24, 2004
- Tokyo Electron Limited
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 6,558,476
- Issue date May 6, 2003
- Tokyo Electron Limited
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 6,399,517
- Issue date Jun 4, 2002
- Tokyo Electron Limited
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and apparatus
- Patent number 6,199,564
- Issue date Mar 13, 2001
- Tokyo Electron Limited
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for washing substrates
- Patent number 5,817,185
- Issue date Oct 6, 1998
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for washing substrates
- Patent number 5,730,162
- Issue date Mar 24, 1998
- Tokyo Electron Limited
- Naoki Shindo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20100319734
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Teruomi MINAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD
- Publication number 20080053489
- Publication date Mar 6, 2008
- TOKYO ELECTRON LIMITED
- Shogo Mizota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method of securing a workpiece during high-pressure p...
- Publication number 20040211447
- Publication date Oct 28, 2004
- Supercritical Systems, Inc.
- Kenji Yokomizo
- B08 - CLEANING
Information Patent Application
Etching method and etching apparatus
- Publication number 20020102851
- Publication date Aug 1, 2002
- TOKYO ELECTRON LIMITED
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20020001967
- Publication date Jan 3, 2002
- KENJI YOKOMIZO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method and apparatus
- Publication number 20010004899
- Publication date Jun 28, 2001
- TOKYO ELECTRON LIMITED
- Kenji Yokomizo
- H01 - BASIC ELECTRIC ELEMENTS

Kenji Yokomizo

Person

Patents Grantslast 30 patents

Liquid processing apparatus, liquid processing method, and storage...

Substrate cleaning method

Apparatus and method of securing a workpiece during high-pressure p...

Etching method and etching apparatus

Substrate processing method

Etching method and etching apparatus

Substrate processing method and apparatus

Method for washing substrates

Apparatus and method for washing substrates

Patents Applicationslast 30 patents

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

SUBSTRATE CLEANING METHOD

Apparatus and method of securing a workpiece during high-pressure p...

Etching method and etching apparatus

ETCHING METHOD AND ETCHING APPARATUS

Substrate processing method and apparatus