Kenjiro ICHIKAWA

Person

Tokyo, JP

People

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
- Publication number 20240288763
- Publication date Aug 29, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Daisuke Miyawaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20240272542
- Publication date Aug 15, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Yuto YAMAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20240126160
- Publication date Apr 18, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Ayumi GODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20240077796
- Publication date Mar 7, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Hideaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20240053670
- Publication date Feb 15, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Yuto YAMAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK
- Publication number 20240019776
- Publication date Jan 18, 2024
- Kenjiro ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20230176467
- Publication date Jun 8, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kenjiro ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230147988
- Publication date May 11, 2023
- TOPPAN INC.
- Hideaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230143851
- Publication date May 11, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Ayumi GODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK
- Publication number 20220404693
- Publication date Dec 22, 2022
- TOPPAN INC.
- Kenjiro ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20220397817
- Publication date Dec 15, 2022
- TOPPAN PHOTOMASK CO., LTD.
- Hideaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kenjiro ICHIKAWA

Person

Patents Applicationslast 30 patents

REFLECTIVE PHOTOMASK AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE MASK AND METHOD FOR PRODUCING REFLECTIVE MASK

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

REFLECTIVE MASK AND PRODUCTION METHOD FOR REFLECTIVE MASK

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK