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Kenjiro Ogata
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Osaka, JP
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last 30 patents
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Patent Grant
High removal rate chemical mechanical polishing pads and methods of...
Patent number
10,722,999
Issue date
Jul 28, 2020
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Thomas P. Willumstad
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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last 30 patents
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Patent Application
HIGH REMOVAL RATE CHEMICAL MECHANICAL POLISHING PADS AND METHODS OF...
Publication number
20170361421
Publication date
Dec 21, 2017
Rohm and Haas Electronic Materials CMP Holdings, INC.
Thomas P. Willumstad
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...