Kenneth Christopher Racette

Person

Fairfax, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for reducing photo-mask distortion
- Patent number 7,473,501
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Nancy Chenxin Zhou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting gravitational sag in photomasks...
- Patent number 7,239,376
- Issue date Jul 3, 2007
- International Business Machines Corporation
- Michael S. Hibbs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monolithic hard pellicle
- Patent number 7,110,195
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,979,518
- Issue date Dec 27, 2005
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,858,357
- Issue date Feb 22, 2005
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,730,445
- Issue date May 4, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin tantalum silicon composite film formation and annealing for us...
- Patent number 6,696,205
- Issue date Feb 24, 2004
- International Business Machines Corporation
- Cameron J. Brooks
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,682,860
- Issue date Jan 27, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,653,027
- Issue date Nov 25, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
A METHOD AND APPARATUS FOR CORRECTING GRAVITATIONAL SAG IN PHOTOMAS...
- Publication number 20070024831
- Publication date Feb 1, 2007
- International Business Machines Corporation
- Michael S. Hibbs
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOLITHIC HARD PELLICLE
- Publication number 20050243452
- Publication date Nov 3, 2005
- International Business Machines Corporation
- Emily F. Gallagher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20040170907
- Publication date Sep 2, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reflective mask structure and method of formation
- Publication number 20040131947
- Publication date Jul 8, 2004
- International Business Machines Corporation
- Emily Fisch Gallagher
- B82 - NANO-TECHNOLOGY
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20040053026
- Publication date Mar 18, 2004
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20030194568
- Publication date Oct 16, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20030194569
- Publication date Oct 16, 2003
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20020119378
- Publication date Aug 29, 2002
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin tantalum silicon composite film formation and annealing for us...
- Publication number 20020114999
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Cameron J. Brooks
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Kenneth Christopher Racette

Person

Patents Grantslast 30 patents

Method for reducing photo-mask distortion

Method and apparatus for correcting gravitational sag in photomasks...

Monolithic hard pellicle

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Thin tantalum silicon composite film formation and annealing for us...

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Patents Applicationslast 30 patents

A METHOD AND APPARATUS FOR CORRECTING GRAVITATIONAL SAG IN PHOTOMAS...

MONOLITHIC HARD PELLICLE

Attenuated embedded phase shift photomask blanks

Reflective mask structure and method of formation

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Thin tantalum silicon composite film formation and annealing for us...