Kenneth D. Smyth

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Wafer pre-clean reactor cable termination for selective suppression...
- Patent number 7,780,814
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- John A. Pipitone
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of variable impedance having rotating core to control coil sput...
- Patent number 6,254,738
- Issue date Jul 3, 2001
- Applied Materials, Inc.
- Bradley O. Stimson
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Multi-zone RF inductively coupled source configuration
- Patent number 6,083,344
- Issue date Jul 4, 2000
- Applied Materials, Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber with fixed RF matching
- Patent number 5,643,364
- Issue date Jul 1, 1997
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Wafer pre-clean reactor cable termination for selective suppression...
- Publication number 20070006972
- Publication date Jan 11, 2007
- APPLIED MATERIALS, INC.
- John A. Piptone
- H01 - BASIC ELECTRIC ELEMENTS