Kenneth E. Gonsalves

Person

Concord, NC, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 10,310,375
- Issue date Jun 4, 2019
- Kenneth E Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 8,685,616
- Issue date Apr 1, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Biocompatible resists
- Patent number 8,119,392
- Issue date Feb 21, 2012
- The University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators and lithographic resists comprising the same
- Patent number 7,833,690
- Issue date Nov 16, 2010
- The University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High resolution resists for next generation lithographies
- Patent number 7,776,505
- Issue date Aug 17, 2010
- The University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanocomposite negative resists for next generation lithographies
- Patent number 7,049,044
- Issue date May 23, 2006
- The University of North Carolina at Charlotte
- Kenneth Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High resolution resists for next generation lithographies
- Patent number 7,008,749
- Issue date Mar 7, 2006
- The University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Photoacid Generators And Lithographic Resists Comprising The Same
- Publication number 20140315130
- Publication date Oct 23, 2014
- University of North Carolina at Charlotte
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME
- Publication number 20110159431
- Publication date Jun 30, 2011
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoacid generators and lithographic resists comprising the same
- Publication number 20070117043
- Publication date May 24, 2007
- Kenneth E. Gonsalves
- C07 - ORGANIC CHEMISTRY
Information Patent Application
High resolution resists for next generation lithographies
- Publication number 20060121390
- Publication date Jun 8, 2006
- Kenneth E. Gonsalves
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES
- Publication number 20060088787
- Publication date Apr 27, 2006
- Kenneth Gonsalves
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Biocompatible resists
- Publication number 20050014098
- Publication date Jan 20, 2005
- Kenneth E. Gonsalves
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High resolution resists for next generation lithographies
- Publication number 20020182541
- Publication date Dec 5, 2002
- Kenneth E. Gonsalves
- B82 - NANO-TECHNOLOGY

Kenneth E. Gonsalves

Person

Patents Grantslast 30 patents

Photoacid generators and lithographic resists comprising the same

Photoacid generators and lithographic resists comprising the same

Biocompatible resists

Photoacid generators and lithographic resists comprising the same

High resolution resists for next generation lithographies

Nanocomposite negative resists for next generation lithographies

High resolution resists for next generation lithographies

Patents Applicationslast 30 patents

Photoacid Generators And Lithographic Resists Comprising The Same

PHOTOACID GENERATORS AND LITHOGRAPHIC RESISTS COMPRISING THE SAME

Photoacid generators and lithographic resists comprising the same

High resolution resists for next generation lithographies

NANOCOMPOSITE NEGATIVE RESISTS FOR NEXT GENERATION LITHOGRAPHIES

Biocompatible resists

High resolution resists for next generation lithographies