Kenri Konno

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for nanoimprint and nanoimprint pattern forming method
- Patent number 9,746,766
- Issue date Aug 29, 2017
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri Konno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 9,250,531
- Issue date Feb 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, radical polymerization initiator, method for producing co...
- Patent number 9,097,971
- Issue date Aug 4, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition for EUV or EB, and method of forming resist pattern
- Patent number 9,057,948
- Issue date Jun 16, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 9,023,581
- Issue date May 5, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,986,919
- Issue date Mar 24, 2015
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern and polymeric...
- Patent number 8,795,948
- Issue date Aug 5, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,586,281
- Issue date Nov 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20240166779
- Publication date May 23, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20240158541
- Publication date May 16, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PRODUCTION METHOD FOR REFINED PRODUCT OF METAL NANOPARTICLE-CONTAIN...
- Publication number 20220371092
- Publication date Nov 24, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- B22 - CASTING POWDER METALLURGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20220373889
- Publication date Nov 24, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD OF PRODUCING CURABLE COMPOSITION
- Publication number 20220347913
- Publication date Nov 3, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takeshi IWAI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
NANOIMPRINT COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20220334470
- Publication date Oct 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20220334475
- Publication date Oct 20, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR NANOIMPRINT AND NANOIMPRINT PATTERN FORMING METHOD
- Publication number 20160306276
- Publication date Oct 20, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Kenri KONNO
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION...
- Publication number 20140162193
- Publication date Jun 12, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...
- Publication number 20140141373
- Publication date May 22, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshiyuki Utsumi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN
- Publication number 20140093824
- Publication date Apr 3, 2014
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Kawana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...
- Publication number 20140004467
- Publication date Jan 2, 2014
- TOKYO OHKA KOGYO CO., LTD.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20130252180
- Publication date Sep 26, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Takahiro Dazai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130143159
- Publication date Jun 6, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20130089819
- Publication date Apr 11, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Akiya Kawaue
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20130071789
- Publication date Mar 21, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION FOR EUV, METHOD FOR PRODUCING RESIST COMPOSITION...
- Publication number 20120208124
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...
- Publication number 20120208128
- Publication date Aug 16, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Daichi Takaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...
- Publication number 20120100487
- Publication date Apr 26, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110311912
- Publication date Dec 22, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IWASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kenri Konno

Person

Patents Grantslast 30 patents

Composition for nanoimprint and nanoimprint pattern forming method

Method of forming resist pattern and negative tone-development resi...

Compound, radical polymerization initiator, method for producing co...

Resist composition for EUV or EB, and method of forming resist pattern

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern and polymeric...

Resist composition, method of forming resist pattern and polymeric...

Positive resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

PHOTOCURABLE COMPOSITION AND PATTERN FORMATION METHOD

PHOTOCURABLE COMPOSITION AND PATTERN-FORMING METHOD

PRODUCTION METHOD FOR REFINED PRODUCT OF METAL NANOPARTICLE-CONTAIN...

PATTERN FORMING METHOD

PATTERN FORMING METHOD AND METHOD OF PRODUCING CURABLE COMPOSITION

NANOIMPRINT COMPOSITION AND PATTERN FORMING METHOD

PHOTOCURABLE COMPOSITION AND PATTERN FORMING METHOD

COMPOSITION FOR NANOIMPRINT AND NANOIMPRINT PATTERN FORMING METHOD

RESIST COMPOSITION FOR EUV, METHOD OF PRODUCING RESIST COMPOSITION...

COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING CO...

RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN

METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION FOR EUV OR EB, AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION FOR EUV, METHOD FOR PRODUCING RESIST COMPOSITION...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC...

POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN